Effect of Resident Stress on the Aberration Correction Ability of MEMS Spatial Light Modulator

2011 ◽  
Vol 317-319 ◽  
pp. 1677-1680
Author(s):  
Fang Rong Hu ◽  
Yi Xian Qian ◽  
Jun Hao Niu ◽  
Li Juan Zhang ◽  
Kun Nie
Keyword(s):  
Tensile Stress ◽  
Simulation Model ◽  
Spatial Light Modulator ◽  
Optical Simulation ◽  
Curvature Radius ◽  
Aberration Correction ◽  
Strehl Ratio ◽  
Light Modulator ◽  
Surface Flatness ◽  
Resident Stress

In this paper, the effect of resident stress on surface flatness and aberration correction ability of spatial light modulator (SLM) is studied. An optical simulation model based on ZEMAX software is presented to calculate the Strehl ratio of SLM. The result shows that the decrease of curvature radius can result in the decrease of Strehl ratio and aberration correction ability. Moreover, resident tensile stress and resident compressive stress have the same effect on the change of Strehl ratio.

High-Resolution Correction of Arbitrary Wavefront Aberration Using Liquid Crystal Spatial Light Modulator

2011 ◽  
Vol 121-126 ◽  
pp. 877-881
Author(s):  
Hong Xin Zhang ◽  
Xiao Xi Xu
Keyword(s):  
Liquid Crystal ◽  
High Resolution ◽  
Spatial Light Modulator ◽  
Low Cost ◽  
Phase Conjugation ◽  
Astronomical Observation ◽  
Wavefront Aberration ◽  
Strehl Ratio ◽  
Light Modulator ◽  
Wavefront Correction

Wavefront correction plays significant role in some fields like astronomical observation, laser processing and medical imaging, etc. Liquid crystal spatial light modulator ( LC SLM) is an ideal device for high-resolution wavefront correction because of its low cost, low consumption, large number of pixels and independent programming control of each unit. It is researched experimentally that LC SLM is used as a wavefront correction device and corrects arbitrary wavefront aberration. Wavefront correction is performed based on phase conjugation and periodic phase modulation with modulo-2π. The experimental results show that the PV value of the irregular wavefront aberration is 1.56λ, RMS value is 0.25 and Strehl ratio is 0.08 before correction, but the PV value of the residual aberration is reduced to 0.26λ, RMS value is 0.02 and Strehl ratio is increased to 0.97 which is approximated diffraction limit after correction. It is proved to be feasible and effective that LC SLM is used to the high-precision and high-resolution wavefront correction.

scholarly journals Dynamic aberration correction via spatial light modulator (SLM) for femtosecond direct laser writing: towards spherical voxels

2020 ◽  
Vol 28 (19) ◽  
pp. 27850
Author(s):  
Gabrielius Kontenis ◽  
Darius Gailevičius ◽  
Linas Jonušauskas ◽  
Vytautas Purlys
Keyword(s):  
Spatial Light Modulator ◽  
Aberration Correction ◽  
Direct Laser Writing ◽  
Light Modulator ◽  
Laser Writing ◽  
Direct Laser
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