Investigation of Phosphorus In-Diffusion and Strain in GaAsP/GaAs Using High-Resolution Transmission Electron Microscopy

2020 ◽  
Vol 62 ◽  
pp. 1-7
Author(s):  
Wonjae Chang
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Molecular Beam ◽  
Growth Direction ◽  
Gaas Layer ◽  
Strained Layers ◽  
Atomic Arrangement ◽  
Transmission Electron ◽  
Substrate Temperatures

We report our experiments based on the interfaces of a 5-period superlattice, containing GaAsP(3Å)/GaAs (190Å) heterostructures grown by molecular beam epitaxy (MBE). The atomic arrangement at the interfaces of GaAsP/GaAs is investigated using high resolution transmission electron microscopy (HRTEM). Our results indicate that the superlattice was grown coherently with strained layers. We propose that the atomic arrangement at the interface is GaP, assuming that phosphorus incorporation occurs primarily via substitution due to desorption of arsenic at the surface for substrate temperatures above 500°C. The incorporation of phosphorus has been investigated using fast Fourier transform (FFT) patterns and shows a form of strain distribution near the heterointerface. The FFT patterns of the superlattice reveal that strain distributes mostly near the interface and gradually decreases along the direction of growth. Phosphorus diffused into a GaAs layer changes the lattice constant in the growth direction, which reduces strain in the superlattice.

Structure and Optical Properties of Si/InAs/Si Layers Grown by MBE on Si Substrate at Different Temperatures

2000 ◽  
Vol 618 ◽  
Author(s):  
N.D. Zakharov ◽  
P. Werner ◽  
U. Gösele ◽  
R. Heitz ◽  
D. Bimberg ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Solid Solution ◽  
Transmission Electron Microscopy ◽  
Optical Properties ◽  
High Resolution ◽  
Molecular Beam ◽  
Growth Direction ◽  
Si Substrate ◽  
Transmission Electron ◽  
Different Temperatures

ABSTRACTEpitaxial Si/InAs/Si heterostructure grown on (001) Si substrate by molecular beam epitaxy (MBE) and annealed at 800°C, and 880°C were investigated by High Resolution Transmission Electron Microscopy (HRTEM). Extensive interdiffusion at 800°C leads to the formation of an InAs solid solution as well as InAs-enriched regions with extensions of ∼6nm, which exhibit two kinds of ordering. The ordering of InAs molecules occurred, respectively, in {110} planes inclined and parallel to the [001] growth direction. It is attributed to the energy gain from the reduced number of mixed Si-As and Si-In bonds. The sample grown at 800°C shows photoluminescence in the 1.3.µm region, which is tentatively attributed to the recombination of excitons localised in the ordered regions

Vertical self-organization of Ge1−xMnx nanocolumn multilayers grown on Ge(001) substrates

2016 ◽  
Vol 30 (20) ◽  
pp. 1650269 ◽  
Author(s):  
Thi Giang Le ◽  
Minh Tuan Dau
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Molecular Beam Epitaxy ◽  
Elastic Constant ◽  
Structural Properties ◽  
Molecular Beam ◽  
Self Organization ◽  
Transmission Electron ◽  
2D Model

High-resolution transmission electron microscopy (HR-TEM) has been used to investigate the structural properties of GeMn/Ge nanocolumns multilayer samples grown on Ge(001) substrates by means of molecular beam epitaxy (MBE) system. Four bilayers with the spacer thickness in the range between 6 nm and 15 nm and 10 periods of bilayers of Ge[Formula: see text]Mn[Formula: see text]/Ge nanocolumn are presented. A simplified 2D model based on the theory of elastic constant interactions has been used to provide reasonable explanations to the vertical self-organization of GeMn nanocolumns in multilayers.

High Resolution Transmission Electron Microscopy of PbTe/Pb1-zEuxSeyTe1-v, Heterostructures.

1986 ◽  
Vol 77 ◽  
Author(s):  
L. Salamanca-Young ◽  
D. L. Partin ◽  
J. Heremans ◽  
E. M. Dresselhaus
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Molecular Beam ◽  
Computing Methods ◽  
Misfit Dislocations ◽  
Structural Perfection ◽  
Superlattice Structure ◽  
Transmission Electron ◽  
Simulated Images

ABSTRACTHigh resolution transmission electron microscopy has been used to study the structure of PbTe/Pb1-zEuxSeyTe1-v semiconductor superlattices and heterojunctions grown on BaF2 substrates by molecular beam epitaxy. The objective of this study is to analyze the interface sharpness and the structural perfection of the samples at their interfaces. In the PbTe/Pb1-zEuxSeyTe1-v system, we have observed misfit dislocations and even amorphous regions for high Eu concentrations. We have also observed two directions of growth of the superlattice film. The interface appears to be sharp to approximately three monolayers. A model for the superlattice structure is suggested and used to obtain simulated images using computing methods. The simulated images are compared with those obtained experimentally.

Double Periodicity Formation in EuTe/PbTe Superlattices

1995 ◽  
Vol 399 ◽  
Author(s):  
M. Shima ◽  
L. Salamanca-Riba ◽  
G. Springholz ◽  
G. Bauer
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
X Ray Diffraction ◽  
X Ray ◽  
Transmission Electron ◽  
Short Period ◽  
Short Period Superlattices

ABSTRACTMolecular beam epitaxy was used to grow EuTe(x)/PbTe(y) short period superlattices with x=1-4 EuTe(111) monolayers alternating with y≈3x PbTe monolayers. The superlattices were characterized by transmission electron microscopy and high resolution x-ray diffraction. Regions with double periodicity were observed coexisting with areas of nominal periodicity. The sample with x=3.5 and y=9, for example, contains regions with double periodicity of x=7 and y=17. X-ray diffraction measurements confirm the formation of the double periodicity in these samples by the appearance of weak satellites in between the satellites of the nominal periodicity. The double periodicity in the superlattice is believed to result from interdiffusion during the growth. A model for this process is presented.

Molecular Beam Epitaxial Growth of Cdl-xznxTe Matched to HgCdTe Alloys

1986 ◽  
Vol 90 ◽  
Author(s):  
N. Magnea ◽  
F. Dal'bo ◽  
J. L. Pautrat ◽  
A. Million ◽  
L. Di Cioccio ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Molecular Beam ◽  
Bulk Material ◽  
Strained Layers ◽  
Molecular Beam Epitaxial ◽  
Transmission Electron ◽  
Molecular Beam Epitaxial Growth ◽  
Thick Layers

ABSTRACTCD1−xZnxTe alloys of various composition have been grown by the Molecular Beam Epitaxy Technique and characterized by Transmission Electron Microscopy. C(V) measurements and photoluminescence spectroscopy techniques. The quality of the thick layers is comparable to that of bulk material. Thin strained layers have also been grown whose interfaces are structurally good. The recombination within a CdTe well confined between Cd1−xZnxTe barriers is dominated by intrinsic processes.

Defects in Mbe-Grown GaAs/ScxEr1–xAs/GaAs Layers

1990 ◽  
Vol 198 ◽  
Author(s):  
Jane G. Zhu ◽  
Chris J. Palmstrdøm ◽  
C. Barry Carter
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Molecular Beam Epitaxy ◽  
Growth Stage ◽  
Molecular Beam ◽  
Gaas Layer ◽  
Stacking Fault ◽  
Initial Growth ◽  
Gaas Substrates ◽  
Transmission Electron

ABSTRACTThe microstructure and the structure of defects in GaAs/ScxEr1–xAs/GaAs (x=0 and 0.3) heterostructures grown on (100) GaAs substrates by molecular beam epitaxy have been characterized using transmission electron microscopy. The top GaAs layer forms islands on ScxEr1–xAs at the initial growth stage, and the area covered by GaAs varies with the growth temperature. In addition to regions of epitactic (100) GaAs, regions of {122}- and (111)-oriented GaAs are observed on (100)-oriented ScxEr1–xAs. A high density of stacking-fault pyramids is found in epilayers of GaAs grown on a thin epilayer of ErAs, where the ErAs layers are only one or two monolayers thick. The apex of each stacking-fault pyramid is located at the ScxEr1–xAs/GaAs interface.

Gas-source molecular beam epitaxy of monocrystalline β–SiC on vicinal α(6H)–SiC

1993 ◽  
Vol 8 (11) ◽  
pp. 2753-2756 ◽  
Author(s):  
L.B. Rowland ◽  
R.S. Kern ◽  
S. Tanaka ◽  
Robert F. Davis
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Nucleation And Growth ◽  
Epitaxial Films ◽  
Gas Source ◽  
Transmission Electron ◽  
Surface Migration

Single-crystal epitaxial films of cubic β(3C)–SiC(111) have been deposited on hexagonal α(6H)–SiC(0001) substrates oriented 3–4° toward [1120] at 1050–1250 °C via gas-source molecular beam epitaxy using disilane (Si2H6) and ethylene (C2H4). High-resolution transmission electron microscopy revealed that the nucleation and growth of the β(3C)–SiC regions occurred primarily on terraces between closely spaced steps because of reduced rates of surface migration at the low growth temperatures. Double positioning boundaries were observed at the intersections of these regions.

Structural Characterization of Fe3O4–NiO Superlattices Using High-reSolution Transmission Electron Microscopy

1997 ◽  
Vol 12 (8) ◽  
pp. 2143-2151 ◽  
Author(s):  
A. Rečnik ◽  
D. L. Carroll ◽  
K. A. Shaw ◽  
D. M. Lind ◽  
M. Rühle
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Molecular Beam ◽  
Spin Exchange ◽  
Magnetic Ordering ◽  
Misfit Dislocations ◽  
Transmission Electron ◽  
High Degree

Superlattices of Fe3O4–NiO layers have been studied by high-resolution transmission electron microscopy (HRTEM). These superlattices are grown by oxygen-plasma-assisted molecular-beam epitaxy (MBE) on (001) oriented MgO substrates, and exhibit a high degree of ordering at the interfaces between the interlayers. The lack of misfit dislocations at the Fe3O4–NiO interfaces suggeststhat lattice strain is largely accommodated by changes in the lattice spacing. By quantitative HRTEM analysis of Fe3O4–NiO interfaces, possible atomic models are discussed, having implications in magnetic ordering and spin exchange mechanisms for such interlayer systems.

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