Kinetic Monte Carlo Simulation of the Flux Dependence of Semiconductor Quantum Dot Growth

2010 ◽  
Vol 663-665 ◽  
pp. 199-202
Author(s):  
Chang Zhao ◽  
Man Zhao ◽  
Yi Wang ◽  
Ai Jun Lv ◽  
Guang Ming Wu

Performing an event-based continuous kinetic Monte Carlo (KMC) simulation, all the important kinetic behaviors take place during the growth of the semiconductor material in the molecular beam epitaxy (MBE) system such as deposition, diffusion, desorption, and nucleation are considered, we investigate the effects of the growth conditions which are important to form semiconductor quantum dot (QD) in MBE system. The simulation results provide a detailed characterization of the atomic kinetic effects. The KMC simulation is also used to explore the effects of anisotropy effects to the epitaxy growth of QD. We find that the flux plays an important role in determining the size of the QD. The agreement between our simulation and experiment indicates that this KMC simulation is useful to study the growth mode and the atomic kinetics during the growth of the semiconductor QDs in MBE system.

2007 ◽  
Vol 121-123 ◽  
pp. 1073-1076
Author(s):  
C. Zhao ◽  
Y.H. Chen ◽  
J. Sun ◽  
W. Lei ◽  
C.X. Cui ◽  
...  

Performing an event-based continuous kinetic Monte Carlo (KMC) simulation, We investigate the growth conditions which are important to form semiconductor quantum dot (QD) in molecular beam epitaxy (MBE) system. The simulation results provide a detailed characterization of the atomic kinetic effects. The KMC simulation is also used to explore the effects of periodic strain to the epitaxy growth of QD. The simulation results are in well qualitative agreement with experiments.


2014 ◽  
Vol 28 (05) ◽  
pp. 1450033
Author(s):  
Chang Zhao ◽  
M. Zhao ◽  
Y. Wang ◽  
A. J. Lv ◽  
G. J. Xing ◽  
...  

In this study, the modified effects of stress originating from the dislocation on the substrate to the semiconductor quantum dot growth are investigated by performing an event-based continuous kinetic Monte Carlo simulation, in which the contribution of the dangling bond of the atom is considered. The research results indicate that the change of binding energy initiated by the stress between the deposit atom and the substrate's atoms may significantly influence the atoms' kinetic behaviors, and on the pattern surface the atoms' kinetic effects are very sensitive to the initial condition of the substrate. In addition, the dependence of the atomic kinetics on the growth flux and temperature are also studied. The simulation results are in good qualitative agreement with those of our experiment.


2021 ◽  
Vol 29 ◽  
pp. 95-115
Author(s):  
Rafal Kozubski ◽  
Graeme E. Murch ◽  
Irina V. Belova

We review the results of our Monte Carlo simulation studies carried out within the past two decades in the area of atomic-migration-controlled phenomena in intermetallic compounds. The review aims at showing the high potential of Monte Carlo methods in modelling both the equilibrium states of the systems and the kinetics of the running processes. We focus on three particular problems: (i) the atomistic origin of the complexity of the ‘order-order’ relaxations in γ’-Ni3Al; (ii) surface-induced ordering phenomena in γ-FePt and (iii) ‘order—order’ kinetics and self-diffusion in the ‘triple-defect’ β-NiAl. The latter investigation demonstrated how diverse Monte Carlo techniques may be used to model the phenomena where equilibrium thermodynamics interplays and competes with kinetic effects.


2006 ◽  
Vol 100 (8) ◽  
pp. 084313 ◽  
Author(s):  
M. Gurioli ◽  
M. Zamfirescu ◽  
A. Vinattieri ◽  
S. Sanguinetti ◽  
E. Grilli ◽  
...  

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