Simulation of Substrate Temperature Distribution in Diamond Films Growth on Silicon Wafer by Hot Filament CVD

2011 ◽  
Vol 697-698 ◽  
pp. 454-457 ◽  
Author(s):  
T. Zhang ◽  
Jian Guo Zhang ◽  
Bin Shen ◽  
Fang Hong Sun
Keyword(s):  
Growth Rate ◽  
Temperature Distribution ◽  
Substrate Temperature ◽  
Diamond Films ◽  
Great Influence ◽  
Chemical Vapor ◽  
Deposition Parameters ◽  
Simulation Results ◽  
Hot Filament

The substrate temperature has great influence on the growth rate and quality of diamond films by hot filament chemical vapor deposition (HFCVD). In order to deposit polycrystalline diamond films of uniform thickness over large areas and improve the growth rate of diamond films, the substrate temperature uniformity need to be further improved. Thus three-dimensional finite volume simulation has been developed to predict substrate temperature distribution, and optimize the deposition parameters like the size and arrangement of filaments which have a profound effect on the substrate temperature. Based on the simulation results, the optimum parameters of diamond deposition are found. Subsequently, experiments of depositing diamond films on silicon (100) wafers are done when the deposition parameters are fixed at optimum values gained from the simulation results. According to the results of scanning electron microscopy (SEM) and Raman spectroscopy, the thickness and quality of diamond films are homogeneous, which validate that the simulated deposition parameters are conducive to fabricate the high quality diamond films.

Simulation of Substrate Temperature Distribution in Diamond Films Growth on Cemented Carbide Inserts by Hot Filament CVD

2007 ◽  
Vol 10-12 ◽  
pp. 864-868 ◽  
Author(s):  
Wei Zuo ◽  
Bin Shen ◽  
Fang Hong Sun ◽  
Ming Chen
Keyword(s):  
Temperature Distribution ◽  
Three Dimensional ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Deposition Parameters ◽  
Dimensional Finite Element ◽  
Simulation Results ◽  
Three Dimensional Finite Element ◽  
Hot Filament ◽  
Carbide Inserts

Three-dimensional finite element simulations were used to investigate the influences of various hot filaments and other deposition parameters on the temperature field of substrates which affect significantly the growth and quality of diamond films by hot filament chemical vapor deposition (HFCVD) and based on the simulation results, the optimum position for diamond deposition was found. In the experiment, six cemented tungsten carbide inserts were used as substrates and placed on the workbench in the CVD reactor to deposit diamond films. According to the temperature distribution on substrates measured by thermocouple fixed in CVD reactor, the simulations were validated and the optimum arrangement of substrates was established from the simulation results. In addition, the simulation model was altered to optimize the process parameters of HFCVD deposition, and an improved process of depositing diamond films with high quality was obtained in order to achieve the great surface morphology, which laid the foundation of developing a new method to arrange the substrates in the CVD reactor for depositing diamond films.

Modeling and Analyzing the Temperature Field in EACVD Integration System

2013 ◽  
Vol 568 ◽  
pp. 69-74
Author(s):  
Li Hong Liu
Keyword(s):  
Temperature Field ◽  
Substrate Temperature ◽  
Great Influence ◽  
Chemical Vapor ◽  
Uniform Temperature ◽  
Integration System ◽  
Deposition Parameters ◽  
Uniform Temperature Field ◽  
Hot Filament

Numerical simulations were used to investigate the influence of various hot filaments and other deposition parameters on substrate temperature field which affects significantly the growth and quality of diamond films by Electron-assisted Chemical Vapor Deposition (EACVD). The results show that the hot-filament parameters have great influence on the magnitude of the substrate temperature, the results also show that the hot-filament number, the substrate swing angle and the distance between the hot-filament and the substrate affect the uniformity of the substrate temperature field deeply. Diamond deposition experiments show that the uniform temperature field for the growth of the diamond can be obtained by optimizing the parameters of the hot-filament and the swing substrate.

Modeling and Analyzing the Temperature Field of the Swing Substrate in Miniature EACVD System

2010 ◽  
Vol 431-432 ◽  
pp. 45-48
Author(s):  
Hong Xiang Wang ◽  
Dun Wen Zuo ◽  
Wen Zhuang Lu ◽  
Feng Xu
Keyword(s):  
Heat Transfer ◽  
Growth Rate ◽  
Temperature Field ◽  
Substrate Temperature ◽  
Diamond Films ◽  
Great Influence ◽  
Swing Angle ◽  
Transfer Theory ◽  
Heat Transfer Theory ◽  
Hot Filament

The magnitude and the uniformity of the substrate temperature are the most important factors that affect the quality and the growth rate of diamond films deeply. In this paper, the model of the swing substrate temperature field is established according to the heat transfer theory in Miniature EACVD System, the effects of the hot-filament parameters and the substrate swing parameters on the magnitude and uniformity of the substrate temperature were discussed. The calculated results show that the hot-filament parameters have great influence on the magnitude of the substrate temperature , the results also show that the hot-filament number , the substrate swing angle and the distance between the hot-filament and the substrate affect the uniformity of the substrate temperature field deeply. All the results provide a basis for optimizing the parameters of deposition in Miniature EACVD System.

Simulation of Temperature Distribution in HFCVD Diamond Films Growth on the End Surfaces of Seals

2014 ◽  
Vol 1027 ◽  
pp. 195-198 ◽  
Author(s):  
Jian Jin Liu ◽  
Bo Song ◽  
Tao Zhang ◽  
Fang Hong Sun
Keyword(s):  
Temperature Distribution ◽  
Rotational Speed ◽  
Water Flux ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Uniform Temperature ◽  
Key Factor ◽  
Simulation Results ◽  
Hot Filament ◽  
Milling Tools

The uniform temperature flied of substrates is a key factor to deposit high-quality diamond films on milling tools by the hot filament chemical vapor deposition (HFCVD). In this study, a 3-D computational model is established to simulate the temperature distribution on the substrates. Thereafter, the influence of the rotational speed of worktable n and the water flux of water-cooled worktable Q are investigated. The simulation results show that the increasing of the rotational speed of worktable is suitable to grow homogeneous diamond films and gently decrease the even temperature of seals. What’s more, the deceasing of the water flux will significantly increase the overall temperature of seals.

Simulation of Temperature Distribution in HFCVD Diamond Films Growth on WC-Co Drill Tools in Large Quantities

2013 ◽  
Vol 589-590 ◽  
pp. 399-404 ◽  
Author(s):  
Lei Cheng ◽  
Jian Guo Zhang ◽  
Xin Chang Wang ◽  
Tao Zhang ◽  
Bin Shen ◽  
...  
Keyword(s):  
Temperature Distribution ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Temperature Data ◽  
Diamond Coating ◽  
Substrate Distance ◽  
Complex Shapes ◽  
Simulation Results ◽  
Volume Method ◽  
Hot Filament

The substrate temperature distribution in hot filament chemical vapor deposition (HFCVD) diamond films growth on drill tools in large quantities are simulated by the finite volume method (FVM), adopting a detailed 3-D computational model corresponding with the actual reactor. Firstly, the correctness of the simulation model is verified by comparing the temperature data obtained from the simulation with that measured in an actual depositing process, and the results show that the error between them is less than 3%. Thereafter, the influences of several parameters are studied, including the filament separation (D), the length of the filament (L) and the filament-substrate distance (H). The simulation results show the three parameters have different effects on the distribution of temperature field. The influence of D is the greatest, L is followed and then H. The simulation has important theoretical guidance on both the development of HFCVD deposition equipment using for the diamond coating on tools with complex shapes in large quantities and the research of related production process.

Particle-Assisted Oriented Deposition of Diamond Thin Films

1996 ◽  
Vol 423 ◽  
Author(s):  
Dong-Gu Lee ◽  
Rajiv K. Singh
Keyword(s):  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Silicon Substrates ◽  
X Ray ◽  
Diamond Particles ◽  
Film Synthesis ◽  
Diamond Powders ◽  
Hot Filament

AbstractWe have developed a method for <111> oriented diamond film synthesis using micron-sized diamond particles. Different size of diamond powders were electrophoretically seeded on silicon substrates using diamond suspensions in organic solvents (acetone, methanol, and ethanol). Diamond suspension in acetone was found to be the best for obtaining uniform diamond seeding by electrophoresis. The thickness of diamond seeded films was changed by varying the applied voltage to observe the effect on the orientation of diamond particles. Then diamond films were deposited by the hot filament chemical vapor deposition (HFCVD) process. A preferred orientation with <111> direction normal to the substrate was obtained for monolayer coatings. The surface morphology, crystal orientation, and quality of diamond films were investigated using scanning electron microscopy, x-ray diffractometry, and Raman spectroscopy.

Improvement on the Cutting Performance of CVD Diamond Coated Drills in Drilling CFRP

2012 ◽  
Vol 499 ◽  
pp. 366-371 ◽  
Author(s):  
Jian Guo Zhang ◽  
Ben Wang ◽  
Fang Hong Sun ◽  
Hang Gao
Keyword(s):  
Thermal Conductivity ◽  
Wear Resistance ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Cutting Performance ◽  
Reinforced Plastics ◽  
Coated Tool ◽  
Hot Filament

Carbon fiber reinforced plastics (CFRP) is difficult to machine because of the extremely abrasive nature of the carbon fibers and its low thermal conductivity. CVD diamond films have many excellent properties such as wonderful wear resistance, high thermal conductivity and low friction coefficient, therefore depositing diamond films on the surface of drills is thought to be an effective way to elongate the lifetime of drills and improve the cutting performance. In this study, diamond films are deposited on the WC-Co drill using hot filament chemical vapor deposition (HFCVD) method. The results of characterization by the scanning electron microscope (SEM) and Raman spectrum indicate that the fabricated CVD diamond coated drill is covered with a layer of uniform and high-purity diamond films. The cutting performance of as-fabricated CVD diamond coated drill is evaluated in dry drilling CFRP, comparing with the uncoated WC-Co drill. The results demonstrate that the CVD diamond coated drill exhibits much stronger wear resistance. Its flank wear is about 50μm after drilling 30 holes, about one-third of that of WC-Co drill. Machining quality of the exit and internal wall of drilled holes shows better surface finish obtained by coated drill, which suggests that CVD diamond coated tool has great advantages in drilling CFRP.

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