Cross-Section Doping Topography of 4H-SiC VJFETs by Various Techniques
2018 ◽
Vol 924
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pp. 653-656
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Keyword(s):
Different methods for cross-section characterization of SiC Trenched-singly-implanted vertical junction field effect transistors (TSI-VJFETs) are presented with the purpose to determine the epitaxial structure in terms of doping topography.
2003 ◽
Vol 19
(1)
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pp. 45-49
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2015 ◽
Vol 30
(12)
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pp. 124001
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2020 ◽
Vol 67
(10)
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pp. 3972-3977
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2015 ◽
Vol 32
(12)
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pp. 127101
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2006 ◽
Vol 53
(5)
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pp. 3004-3012
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