Determination of hole diffusion length in n-GaN

The paper presents the derivation of a model for minority carriers collection based on the reciprocity theorem and its application for determination of hole diffusion length in n-GaN by means of photoluminescence. The estimated hole diffusion lengths at room temperature are 110 nm and 194 nm in the case of low and high excitation, respectively, which could be explained by saturation of non-radiative recombination centers in bulk GaN and at the surface with photogenerated carriers.

Package Design and Analysis for Vertical Gallium Nitride Field Effect Transistors

Gallium nitride (GaN) is a wide band gap semi-conductor with superior electron mobility to silicon carbide. These properties allow for the design of high temperature capable devices with excellent on resistance and breakdown voltage for their size. However, bulk GaN is difficult to fabricate and doping for field effect transistor (FET) control has been elusive, so vertical GaN devices are not commonplace. This paper measures the characteristics of vertical GaN FETs in the development stage and discusses packaging them for fabrication feedback and for future high temperature aplications.