scholarly journals Synthesis and Lubricant Properties of Nitrogen doped Amorphous Carbon (a-C:N) Thin Films by Closed-field unbalanced Magnetron Sputtering Method

2007 ◽  
Vol 20 (8) ◽  
pp. 701-705
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
Closed Field ◽  
Nitrogen Doped ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

Characteristics of Palladium Doped Amorphous Carbon Films Fabricated by Unbalanced Magnetron Sputtering System

2021 ◽  
Vol 16 (6) ◽  
pp. 905-910
Author(s):  
Yong Seob Park ◽  
Young-Baek Kim ◽  
Sung Hwan Hwang ◽  
Jaehyeong Lee
Keyword(s):  
Friction Coefficient ◽  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Amorphous Carbon ◽  
Closed Field ◽  
Hydrogenated Amorphous Carbon ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Dc Bias ◽  
Hydrogenated Amorphous

Generally, hydrogenated amorphous carbon (a-C:H) has been shown to have a low friction coefficient, high hardness, and low abrasive wear rate. In this study, Pd doped hydrogenated amorphous carbon (a-C:H:Pd) fabricated by the closed-field unbalanced magnetron sputtering (CFUBMS) system with two targets of carbon and palladium in Ar/C2H2 plasma. The tribological and lubricant characteristics for a-C:H:Pd fabricated with various DC bias voltage from 0 to −200 V were investigated. We obtained a hardness up to 27.5 GPa and friction coefficient lower than 0.1. The atomic percentage of Pd related to the lubricant properties increased up to 22% at −200 V. In the results, the Pd doping in the a-C:H films improved the tribological and lubricant properties. The friction coefficient value of a-C:H:Pd films was decreased, the hardness and elastic modulus were increased, and also the adhesion properties was improved with the increase of negative DC bias voltage.

Structure and mechanical properties of ZrCrAlN nanostructured thin films by closed-field unbalanced magnetron sputtering

2007 ◽  
Vol 201 (9-11) ◽  
pp. 5547-5551 ◽  
Author(s):  
Youn J. Kim ◽  
Ho Y. Lee ◽  
Yong M. Kim ◽  
Kyung S. Shin ◽  
Woo S. Jung ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Closed Field ◽  
Nanostructured Thin Films ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

Pulsed Closed Field Unbalanced Magnetron Sputtering (P-CFUBMS) Deposited TiC/a:C Thin Films

2007 ◽  
Vol 561-565 ◽  
pp. 1177-1180 ◽  
Author(s):  
Jian Liang Lin ◽  
Brajendra Mishra ◽  
Malki Pinkas ◽  
John J. Moore
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Surface Roughness ◽  
Magnetron Sputtering ◽  
Material Selection ◽  
Closed Field ◽  
Substrate Bias ◽  
Substrate Roughness ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

TiC/a:C nanocomposite thin film has proven to be a worthy material selection as a thin film for tribological applications due to its low coefficient of friction, good wear resistance and high hardness. In the current study TiC/a:C thin films with carbon concentration near 55-62 at % were deposited via pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) in pure argon atmosphere with different substrate bias voltages and onto 440C stainless steel substrate with different substrate roughness. It was found that the TiC/a:C film hardness and elastic modulus were increased from 18.5 GPa to 33.8 GPa by increasing the substrate bias from floating to -150 V. However higher substrate bias can also decrease the film tibological properties. The substrate roughness has a strong effect on TiC/a:C film wear behavior. When the Ra (Mean surface roughness values) is less than 110 nm, the COF values are in low range (0.18-0.28). Further increase the Ra value to above 300 nm will result in a higher COF (>0.33). Films deposited on higher surface roughness substrate need longer time to reach the sliding equilibrium state.

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