Structure and mechanical properties of ZrCrAlN nanostructured thin films by closed-field unbalanced magnetron sputtering

2007 ◽  
Vol 201 (9-11) ◽  
pp. 5547-5551 ◽  
Author(s):  
Youn J. Kim ◽  
Ho Y. Lee ◽  
Yong M. Kim ◽  
Kyung S. Shin ◽  
Woo S. Jung ◽  
...  
2013 ◽  
Vol 591 ◽  
pp. 190-193
Author(s):  
Hao Zhang ◽  
Shu Wang Duo ◽  
Xiang Min Xu ◽  
Ting Zhi Liu

CrN coatings were fabricated by Closed Filed Unbalanced Magnetron Sputtering (CFUMS). The effect of substrate temperature (TS) on phase components, morphologies and mechanical properties of CrN coatings were studied. The results show that the phase in coatings, which has little to do with TS, was the coexistence of Cr, Cr2N and CrN. The grain shape of the columnar crystal CrN coating was the coexistence of pyramidal and plane topography. The hardness and adhension of CrN coating first increased with the rise of temperature, then decreased when the values of both them were constant ones. It has the highest hardness and bonding strength simultaneously at 300°C.


2007 ◽  
Vol 561-565 ◽  
pp. 1177-1180 ◽  
Author(s):  
Jian Liang Lin ◽  
Brajendra Mishra ◽  
Malki Pinkas ◽  
John J. Moore

TiC/a:C nanocomposite thin film has proven to be a worthy material selection as a thin film for tribological applications due to its low coefficient of friction, good wear resistance and high hardness. In the current study TiC/a:C thin films with carbon concentration near 55-62 at % were deposited via pulsed closed field unbalanced magnetron sputtering (P-CFUBMS) in pure argon atmosphere with different substrate bias voltages and onto 440C stainless steel substrate with different substrate roughness. It was found that the TiC/a:C film hardness and elastic modulus were increased from 18.5 GPa to 33.8 GPa by increasing the substrate bias from floating to -150 V. However higher substrate bias can also decrease the film tibological properties. The substrate roughness has a strong effect on TiC/a:C film wear behavior. When the Ra (Mean surface roughness values) is less than 110 nm, the COF values are in low range (0.18-0.28). Further increase the Ra value to above 300 nm will result in a higher COF (>0.33). Films deposited on higher surface roughness substrate need longer time to reach the sliding equilibrium state.


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