scholarly journals Effects of Sputtering Condition on Structural Properties of PZT Thin Films on LTCC Substrate by RF Magnetron Sputtering

Author(s):  
Kyung-Chun Lee ◽  
Hyun-Suk Hwang ◽  
Tae-Yong Lee ◽  
Won-Young Hur ◽  
Joon-Tae Song
2012 ◽  
Vol 626 ◽  
pp. 168-172
Author(s):  
Samsiah Ahmad ◽  
Nor Diyana Md Sin ◽  
M.N. Berhan ◽  
Mohamad Rusop

Zinc Oxide (ZnO) thin films were deposited onto SiO2/Si substrates using radio frequency (RF) magnetron sputtering method as an Ammonia (NH3) sensor. The dependence of RF power (50~300 Watt) on the structural properties and sensitivity of NH3sensor were investigated. XRD analysis shows that regardless of the RF power, all samples display the preferred orientation on the (002) plane. The results show that the ZnO deposited at 200 Watt display the highest sensitivity value which is 44%.


1996 ◽  
Vol 433 ◽  
Author(s):  
W. Jo ◽  
D. C. Kim ◽  
H. M. Lee ◽  
K. Y. Kim

AbstractBa0.5Sr0.5TiO3 thin films were grown by rf-magnetron sputtering. Pt and RuO2 films were used as bottom electrodes of the Ba0.5Sr0.5TiO3 thin films. Further, a Pt/RuO2 hybrid electrode was adopted as an electrode for the film. Structural properties of the Ba0.5Sr0.5TiO3 thin films were found to be closely related to the type of the bottom electrodes. Dielectric constants of the films on Pt, RuO2, and Pt/RuO2 were measured as 500, 320, and 450 in the range of 100 Hz ˜ 1 MHz, respectively. Leakage current characteristics of the films were also found to be strongly dependent on the type of the electrodes and their microstructures.


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