COSEISMIQ: First results of high resolution imaging of the shallow crust and relocation of induced seismicity in the Hengill area, Iceland

Author(s):  
Anne Obermann ◽  
Pilar Sánchez-Pastor ◽  
Alejandro Duran ◽  
Tobias Diehl ◽  
Vala Hjörleifsdóttir ◽  
...  

<p>For the future development of deep geothermal energy exploitation in Europe, large magnitude induced seismic events are an obstacle. On the other hand, the analysis of induced microseismicity allows to obtain the spatial distribution of fractures within the reservoir, which can help, not only to identify active faults that may trigger large induced seismic events, but also to optimize hydraulic stimulation operations and to locate the regions with higher permeability, enhancing energy production. The project COSEISMIQ (COntrol SEISmicity and Manage Induced) integrates seismic monitoring and imaging techniques, geomechanical models and risk analysis methods with the ultimate goal of implementing innovative tools for the management of the risks posed by induced seismicity and demonstrate their usefulness in a commercial scale application in Iceland.</p><p>Our demonstration site is the Hengill region in Iceland. The Hengill volcanic complex is located in SW Iceland on the plate boundary between the North American and Eurasian plates. In this region, the two largest geothermal power plants of Iceland are currently in operation, the Nesjavellir (120MW electricity) and the Hellisheidi (300MW electricity) power stations. In October 2018, we densified the permanent seismic network run by ISOR and IMO in this area (14 stations) with 23 broadband seismic stations.</p><p>We present the project and show first results from high resolution imaging of the shallow crust with ambient seismic noise, as well as first results from the relocated seismic events. The ambient noise imaging highlights an area of low seismic velocity close to the Þingvallavatn Lake, characteristic for the presence of supercritical fluids. The main geothermal production area is located as well in a low velocity zone that reaches 200 meters depth below Hellisheidi and around 700 meters below Nesjavellir.</p><p> </p>

1991 ◽  
Vol 374 ◽  
pp. L65 ◽  
Author(s):  
R. Albrecht ◽  
C. Barbieri ◽  
J. C. Blades ◽  
A. Boksenberg ◽  
P. Crane ◽  
...  

1991 ◽  
Vol 253 (1) ◽  
pp. 21P-24P ◽  
Author(s):  
N. R. Tanvir ◽  
T. Shanks ◽  
J. V. Major ◽  
A. P. Doel ◽  
C. N. Dunlop ◽  
...  

Icarus ◽  
1998 ◽  
Vol 135 (1) ◽  
pp. 276-302 ◽  
Author(s):  
Robert T. Pappalardo ◽  
James W. Head ◽  
Geoffrey C. Collins ◽  
Randolph L. Kirk ◽  
Gerhard Neukum ◽  
...  

1991 ◽  
Vol 9 (1) ◽  
pp. 162-163 ◽  
Author(s):  
J. G. Robertson ◽  
T. R. Bedding ◽  
R. G. Marson ◽  
P. R. Gillingham ◽  
R. H. Frater ◽  
...  

AbstractWe have successfully demonstrated optical aperture synthesis at the 4-m Anglo-Australian Telescope. By using a multi-hole mask over the (re-imaged) primary mirror and recording the resulting fringe patterns with high time resolution, diffraction-limited images of sufficiently bright objects can be reconstructed. The data processing uses closure phases to overcome the effects of atmospheric turbulence. We show an image of the double star η Oph, with component separation 0″.45.


2010 ◽  
Author(s):  
Michael J. Nasse ◽  
Eric Mattson ◽  
Carol Hirschmugl ◽  
Adriana Predoi-Cross ◽  
Brant E. Billinghurst

Author(s):  
J.M. Cowley

By extrapolation of past experience, it would seem that the future of ultra-high resolution electron microscopy rests with the advances of electron optical engineering that are improving the instrumental stability of high voltage microscopes to achieve the theoretical resolutions of 1Å or better at 1MeV or higher energies. While these high voltage instruments will undoubtedly produce valuable results on chosen specimens, their general applicability has been questioned on the basis of the excessive radiation damage effects which may significantly modify the detailed structures of crystal defects within even the most radiation resistant materials in a period of a few seconds. Other considerations such as those of cost and convenience of use add to the inducement to consider seriously the possibilities for alternative approaches to the achievement of comparable resolutions.


Author(s):  
Max T. Otten ◽  
Wim M.J. Coene

High-resolution imaging with a LaB6 instrument is limited by the spatial and temporal coherence, with little contrast remaining beyond the point resolution. A Field Emission Gun (FEG) reduces the incidence angle by a factor 5 to 10 and the energy spread by 2 to 3. Since the incidence angle is the dominant limitation for LaB6 the FEG provides a major improvement in contrast transfer, reducing the information limit to roughly one half of the point resolution. The strong improvement, predicted from high-resolution theory, can be seen readily in diffractograms (Fig. 1) and high-resolution images (Fig. 2). Even if the information in the image is limited deliberately to the point resolution by using an objective aperture, the improved contrast transfer close to the point resolution (Fig. 1) is already worthwhile.


Author(s):  
Xiao Zhang

Electron holography has recently been available to modern electron microscopy labs with the development of field emission electron microscopes. The unique advantage of recording both amplitude and phase of the object wave makes electron holography a effective tool to study electron optical phase objects. The visibility of the phase shifts of the object wave makes it possible to directly image the distributions of an electric or a magnetic field at high resolution. This work presents preliminary results of first high resolution imaging of ferroelectric domain walls by electron holography in BaTiO3 and quantitative measurements of electrostatic field distribution across domain walls.


Author(s):  
George C. Ruben

Single molecule resolution in electron beam sensitive, uncoated, noncrystalline materials has been impossible except in thin Pt-C replicas ≤ 150Å) which are resistant to the electron beam destruction. Previously the granularity of metal film replicas limited their resolution to ≥ 20Å. This paper demonstrates that Pt-C film granularity and resolution are a function of the method of replication and other controllable factors. Low angle 20° rotary , 45° unidirectional and vertical 9.7±1 Å Pt-C films deposited on mica under the same conditions were compared in Fig. 1. Vertical replication had a 5A granularity (Fig. 1c), the highest resolution (table), and coated the whole surface. 45° replication had a 9Å granulartiy (Fig. 1b), a slightly poorer resolution (table) and did not coat the whole surface. 20° rotary replication was unsuitable for high resolution imaging with 20-25Å granularity (Fig. 1a) and resolution 2-3 times poorer (table). Resolution is defined here as the greatest distance for which the metal coat on two opposing faces just grow together, that is, two times the apparent film thickness on a single vertical surface.


Author(s):  
Bertholdand Senftinger ◽  
Helmut Liebl

During the last few years the investigation of clean and adsorbate-covered solid surfaces as well as thin-film growth and molecular dynamics have given rise to a constant demand for high-resolution imaging microscopy with reflected and diffracted low energy electrons as well as photo-electrons. A recent successful implementation of a UHV low-energy electron microscope by Bauer and Telieps encouraged us to construct such a low energy electron microscope (LEEM) for high-resolution imaging incorporating several novel design features, which is described more detailed elsewhere.The constraint of high field strength at the surface required to keep the aberrations caused by the accelerating field small and high UV photon intensity to get an improved signal-to-noise ratio for photoemission led to the design of a tetrode emission lens system capable of also focusing the UV light at the surface through an integrated Schwarzschild-type objective. Fig. 1 shows an axial section of the emission lens in the LEEM with sample (28) and part of the sample holder (29). The integrated mirror objective (50a, 50b) is used for visual in situ microscopic observation of the sample as well as for UV illumination. The electron optical components and the sample with accelerating field followed by an einzel lens form a tetrode system. In order to keep the field strength high, the sample is separated from the first element of the einzel lens by only 1.6 mm. With a numerical aperture of 0.5 for the Schwarzschild objective the orifice in the first element of the einzel lens has to be about 3.0 mm in diameter. Considering the much smaller distance to the sample one can expect intense distortions of the accelerating field in front of the sample. Because the achievable lateral resolution depends mainly on the quality of the first imaging step, careful investigation of the aberrations caused by the emission lens system had to be done in order to avoid sacrificing high lateral resolution for larger numerical aperture.


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