scholarly journals Impacts of Surface Functionalization on the Electrocatalytic Activity of Noble Metals and Nanoparticles

10.5772/37594 ◽  
2012 ◽  
Author(s):  
Zhi-you Zhou ◽  
Shaowei Che

Author(s):  
Ali Bahadur ◽  
Waseem Hussain ◽  
Shahid Iqbal ◽  
Farman Ullah ◽  
Muhammad Shoaib ◽  
...  

Transition metal mixed oxides have drawn extensive interest as oxygen evolution electrocatalysts alternatives to noble metals-based material but generally involve prolonged synthesis routes and limited electrocatalytic activity and stability. Herein...



1964 ◽  
Vol 111 (6) ◽  
pp. 728 ◽  
Author(s):  
Harald Dahms ◽  
John O'M. Bockris


Author(s):  
Huihui Jin ◽  
Jiawei Zhu ◽  
Ruohan Yu ◽  
Wenqiang Li ◽  
Pengxia Ji ◽  
...  

Elemental Bi is effective in optimizing the electrocatalytic activity of perovskite oxides and noble metals, but has never been used to adjust the oxygen reduction activity of Fe/N-C catalysts. Here,...



2019 ◽  
Author(s):  
Maria Paula Salinas-Quezada ◽  
D. Alfonso Crespo-Yapur ◽  
Abraham Cano-Marquez ◽  
Marcelo Videa

Nickel and nickel-based nanomaterials are an attractive choice to replace noble metals as electrocatalyst in alkaline direct alcohol fuel cells (DAFCs) owing to their lower cost and suitable electrocatalytic activity. Among the different synthetic methods available for the production of nanostructured materials, galvanostatic electrodeposition offers a fast and simple means of fabricating active electrodes. Therefore, thin-layers of nickel were electrodeposited onto polycrystalline gold electrodes using constant current pulses from an electrolyte containing 50 mM NiSO4. The electrocatalytic properties of the nickel nanostructures in alkaline medium, in which the catalytic species NiOOH is formed, were evaluated through cyclic voltammetry in 0.5 M methanol + 1 M KOH. The effects of current density pulse and the presence of sulfate or chloride anions in the supporting electrolyte on the electrocatalytic activity of the deposits were studied using Ni(OH)2 surface concentration, Gamma, and electrocatalytic intensity, EI, as performance parameters. It was found that highest electrolcatalytic activities were obtained when using current densities pulses close to 4.0 mA/cm2 in the presence of sulfates. It was found that the presence of sulfates leads to a strong correlation between the electrocatalytic activity for the oxidation of methanol and the surface concentration of Ni(OH)2.



2019 ◽  
Vol 7 (30) ◽  
pp. 18030-18038 ◽  
Author(s):  
Chaoyun Tang ◽  
Hui Zhang ◽  
Kuofeng Xu ◽  
Qianling Zhang ◽  
Jianhong Liu ◽  
...  

The development of noble metal-free catalysts, which can replace noble metals for various electrocatalytic reactions in renewable energy devices is of huge interest. Here, we report nanoporous α-MoC1−x and η-MoC nanosheets electrocatalysts for HER.



2018 ◽  
Vol 8 (18) ◽  
pp. 4757-4765 ◽  
Author(s):  
Xinran Zhang ◽  
Hongsheng Fan ◽  
Jinlong Zheng ◽  
Sibin Duan ◽  
Yunxia Huang ◽  
...  

Highly uniform Pd–Zn nanocrystals were facilely fabricated with coexisting noble metals and ascorbic acid, which exhibited superior electrocatalytic activity for formic acid oxidation.





2010 ◽  
Vol 12 (11) ◽  
pp. 1646-1649 ◽  
Author(s):  
Shuangyin Wang ◽  
Fan Yang ◽  
San Ping Jiang ◽  
Shengli Chen ◽  
Xin Wang


Author(s):  
E. I. Alessandrini ◽  
M. O. Aboelfotoh

Considerable interest has been generated in solid state reactions between thin films of near noble metals and silicon. These metals deposited on Si form numerous stable chemical compounds at low temperatures and have found applications as Schottky barrier contacts to silicon in VLSI devices. Since the very first phase that nucleates in contact with Si determines the barrier properties, the purpose of our study was to investigate the silicide formation of the near noble metals, Pd and Pt, at very thin thickness of the metal films on amorphous silicon.Films of Pd and Pt in the thickness range of 0.5nm to 20nm were made by room temperature evaporation on 40nm thick amorphous Si films, which were first deposited on 30nm thick amorphous Si3N4 membranes in a window configuration. The deposition rate was 0.1 to 0.5nm/sec and the pressure during deposition was 3 x 10 -7 Torr. The samples were annealed at temperatures in the range from 200° to 650°C in a furnace with helium purified by hot (950°C) Ti particles. Transmission electron microscopy and diffraction techniques were used to evaluate changes in structure and morphology of the phases formed as a function of metal thickness and annealing temperature.



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