scholarly journals Structural Effect in Ionic Liquids Is the Vital Role to Enhance the Corrosion Protection of Metals in Acid Cleaning Process

2019 ◽  
Author(s):  
Perumal Kannan ◽  
Anitha Varghese
Keyword(s):  
Ionic Liquids ◽  
Corrosion Protection ◽  
Structural Effect ◽  
Vital Role ◽  
Cleaning Process ◽  
Acid Cleaning ◽  
Protection Of Metals

scholarly journals Review of Recent Developments in the Formulation of Graphene-Based Coatings for the Corrosion Protection of Metals and Alloys

2020 ◽  
Vol 1 (3) ◽  
pp. 296-327
Author(s):  
Bronach Healy ◽  
Tian Yu ◽  
Daniele da Silva Alves ◽  
Carmel B. Breslin
Keyword(s):  
Graphene Oxide ◽  
Corrosion Protection ◽  
Hexagonal Boron Nitride ◽  
Protective Coatings ◽  
Galvanic Corrosion ◽  
Metals And Alloys ◽  
Graphene Layers ◽  
Recent Developments ◽  
Double Hydroxides ◽  
Protection Of Metals

Corrosion is a naturally occurring phenomenon and there is continuous interest in the development of new and more protective coatings or films that can be employed to prevent or minimise corrosion. In this review the corrosion protection afforded by two-dimensional graphene is described and discussed. Following a short introduction to corrosion, the application of graphene in the formulation of coatings and films is introduced. Initially, reduced graphene oxide (rGO) and metallic like graphene layers are reviewed, highlighting the issues with galvanic corrosion. Then the more successful graphene oxide (GO), functionalised GO and polymer grafted GO-modified coatings are introduced, where the functionalisation and grafting are tailored to optimise dispersion of graphene fillers. This is followed by rGO coupled with zinc rich coatings or conducting polymers, GO combined with sol-gels, layered double hydroxides or metal organic frameworks as protective coatings, where again the dispersion of the graphene sheets becomes important in the design of protective coatings. The role of graphene in the photocathodic protection of metals and alloys is briefly introduced, while graphene-like emerging materials, such as hexagonal boron nitride, h-BN, and graphitic carbon nitride, g-C3N4, are then highlighted.

Superhydrophobic surface modification for corrosion protection of metals and alloys

2020 ◽  
Vol 17 (3) ◽  
pp. 583-595 ◽  
Author(s):  
Viriyah Chobaomsup ◽  
Martin Metzner ◽  
Yuttanant Boonyongmaneerat
Keyword(s):  
Surface Modification ◽  
Corrosion Protection ◽  
Superhydrophobic Surface ◽  
Metals And Alloys ◽  
Protection Of Metals

scholarly journals Anionic structural effect in liquid–liquid separation of phenol from model oil by choline carboxylate ionic liquids

2019 ◽  
Vol 4 (2) ◽  
pp. 131-138 ◽  
Author(s):  
Zhiyong Li ◽  
Ruipeng Li ◽  
Xiaoqing Yuan ◽  
Yuanchao Pei ◽  
Yuling Zhao ◽  
...  
Keyword(s):  
Ionic Liquids ◽  
Structural Effect ◽  
Liquid Separation ◽  
Model Oil

scholarly journals Anionic structural effect on the dissolution of arabinoxylan-rich hemicellulose in 1-butyl-3-methylimidazolium carboxylate-based ionic liquids

RSC Advances ◽  
2020 ◽  
Vol 10 (20) ◽  
pp. 11643-11651
Author(s):  
Qi Xia ◽  
Hong Peng ◽  
Lin Yuan ◽  
Lifang Hu ◽  
Yu Zhang ◽  
...  
Keyword(s):  
Ionic Liquids ◽  
Structural Effect ◽  
Environment Friendly ◽  
Highly Efficient

The exploration of a highly efficient and environment-friendly solvent for dissolving hemicellulose is significant.

Advanced Alkali Cleaning Solution for Simplification of Semiconductor Cleaning Process

1997 ◽  
Vol 477 ◽  
Author(s):  
Hitoshi Morinaga ◽  
Masumi Aoki ◽  
Toshiaki Maeda ◽  
Masaya Fujisue
Keyword(s):  
Substrate Surface ◽  
Chelating Agent ◽  
Metallic Impurity ◽  
Cleaning Process ◽  
Drastic Reduction ◽  
Acid Cleaning ◽  
Cleaning Solution ◽  
Cleaning Technology ◽  
Cleaning Cost ◽  
Metallic Impurities

ABSTRACTNH4OH/H2O2/H2O (called APM or SC–1) cleaning combined with megasonic irradiation is found to feature outstanding removal efficiency for various types of particulate contaminant. The conventional APM cleaning, however, allows metallic impurity in solution to adhere onto substrate surface, and it must be followed by acid cleaning such as HCI/IH2O2/H2O (called HPM or SC–2) cleaning to remove metallic impurity from substrate. The advanced APM cleaning using MC–1 which is alkali cleaning agent containing chelating agent has been developed, and this new cleaning is found capable for preventing various metallic impurities including Al in solution from contaminating substrate surface. Besides, with cleaning conditions optimized, the advanced APM cleaning using MC–1 can also remove metallic impurity from substrate surface. In short, this modified APM cleaning is capable for removing particle and metallic impurity at the same time, which is not possible with the conventional cleaning technology. The cleaning process of semiconductor manufacturing process can be simplified if HPM cleaning is eliminated by introducing the advanced APM cleaning using MC–1. This leads to drastic reduction of cleaning cost and improvement of throughput of the cleaning process.

Estimation and Structural Effect on Physicochemical Properties of Alkylimidazolium-Based Ionic Liquids with Different Anions

2016 ◽  
Vol 61 (6) ◽  
pp. 2002-2012 ◽  
Author(s):  
Qingguo Zhang ◽  
Yalin Lan ◽  
Hongwei Liu ◽  
Xinyuan Zhang ◽  
Xuelei Zhang ◽  
...  
Keyword(s):  
Ionic Liquids ◽  
Physicochemical Properties ◽  
Structural Effect
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