scholarly journals Bipolaron mechanism of DX center in AlxGa1-xAs:Si

2010 ◽  
Vol 59 (12) ◽  
pp. 8850
Author(s):  
Liang Ying-Xin ◽  
Li Wei-Feng ◽  
Wei Jian-Hua ◽  
Jin Yong
Keyword(s):  
1995 ◽  
Vol 196-201 ◽  
pp. 1073-1078 ◽  
Author(s):  
T. Laine ◽  
J. Mäkinen ◽  
Kimmo Saarinen ◽  
Pekka J. Hautojärvi ◽  
C. Corbel ◽  
...  

1989 ◽  
Vol 163 ◽  
Author(s):  
Thomas N. Theis ◽  
Patricia M. Mooney

AbstractWe review three important experimental results which suggest that electron capture and emission by the DX center in AlxGa1-xAs proceeds via an excited intermediate state: the very different dependencies of the thermal capture and emission rates on alloy composition, the exponential dependence of the thermal capture rate on the quasi-equilibrium Fermi energy, and the thermal activation of the hot electron capture rate. None of these results is readily explained by a conventional lattice relaxation model, in which an electron is captured directly from the lowest lying band edge, but each can be simply explained if the dominant channel for multiphonon capture is via a transition state which lies well above the band edge. This picture is consistent with recent pseudopotential calculations which predict that the lattice relaxed state (the DX state) is stabilized by capture of more than one electron, since such a model naturally admits the possibility of an intermediate one-electron state.


2004 ◽  
Vol 95 (3) ◽  
pp. 1171-1179 ◽  
Author(s):  
E. Placzek-Popko ◽  
J. Szatkowski ◽  
P. Becla
Keyword(s):  

1993 ◽  
Vol 73 (5) ◽  
pp. 2572-2574 ◽  
Author(s):  
R. Piotrzkowski ◽  
E. Litwin‐Staszewska ◽  
T. Suski ◽  
L. Kończewicz ◽  
J. L. Robert ◽  
...  
Keyword(s):  

1988 ◽  
Vol 144 ◽  
Author(s):  
T. Maed ◽  
T. Ishikawa ◽  
K. Kondo

ABSTRACTWe studied doping Se into AlGaAs layers using PbSe as a dopant source for molecular beam epitaxy (MBE). Good controllability and abruptness equivalent to that of Si-doping were obtained. Se-doping was successfully applied to HEMT structures with reduced DX center concentrations. The two dimensional electron gas (2DEG) characteristics of these structures were comparable to those of Si-doped structures.


1985 ◽  
Vol 56 ◽  
Author(s):  
J. K. ABROKWAH ◽  
H. HIBBS ◽  
R. R. DANIELS ◽  
P. JOSLYN

AbstractThe use of an AlGaAs/n-GaAs superlattice in place of the n-AlGaAs layer in MODFET devices reduces the light and temperature sensitivity of the threshold voltage. This paper considers the stability of Si doped superlattices under annealing conditions required for activation of the implant in the self-aligned gate MODFET fabrication process. Rapid optical annealing does not significantly degrade the superlattice structure. The DX center concentration in the superlattice structures is a factor of 30 less than measured in conventional MODFET structures. High performance MOOFET devices have been fabricated using the self-aligned gate process with rapid optical annealing.


1999 ◽  
Vol 273-274 ◽  
pp. 781-783 ◽  
Author(s):  
Y Yoshino ◽  
K Takarabe ◽  
M Ishii ◽  
Y Katayama ◽  
O Shimomura
Keyword(s):  

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