Stochastic simulation of pattern formation for chemically amplified resist in electron beam lithography
2019 ◽
Vol 58
(SD)
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pp. SDDB01
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2016 ◽
Vol 55
(5)
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pp. 056503
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2002 ◽
Vol 41
(Part 1, No. 6B)
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pp. 4157-4162
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2016 ◽
Vol 55
(10)
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pp. 106502
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1993 ◽
Vol 11
(6)
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pp. 2807
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2011 ◽
Vol 50
(6S)
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pp. 06GD03
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2015 ◽
Vol 54
(9)
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pp. 096501
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