Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: IV. Comparison with experimental results

2016 ◽  
Vol 55 (5) ◽  
pp. 056503 ◽  
Author(s):  
Takahiro Kozawa
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Theoretical Study ◽  
Experimental Results ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation

2002 ◽  
Vol 41 (Part 1, No. 6B) ◽  
pp. 4157-4162 ◽  
Author(s):  
Tetsuro Nakasugi ◽  
Atsushi Ando ◽  
Ryoichi Inanami ◽  
Noriaki Sasaki ◽  
Kazuyoshi Sugihara ◽  
...  
Keyword(s):  
Computer Simulation ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Chemically Amplified Resist ◽  
Low Energy Electron

Dynamics of Radical Cation of Poly(styrene acrylate)-Based Chemically Amplified Resist for Extreme Ultraviolet and Electron Beam Lithography

2011 ◽  
Vol 50 (6S) ◽  
pp. 06GD03 ◽  
Author(s):  
Yasuharu Tajima ◽  
Kazumasa Okamoto ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Ryoko Fujiyoshi ◽  
...  
Keyword(s):  
Electron Beam ◽  
Radical Cation ◽  
Electron Beam Lithography ◽  
Extreme Ultraviolet ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
Sign in / Sign up

Export Citation Format

Share Document