Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in photomask production by electron beam lithography

2019 ◽  
Vol 58 (7) ◽  
pp. 076501 ◽  
Author(s):  
Takahiro Kozawa ◽  
Takao Tamura
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Theoretical Study ◽  
Line Edge Roughness ◽  
Trade Off ◽  
Edge Roughness

Impact of Latent Image Quality on Line Edge Roughness in Electron Beam Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3739-3743 ◽  
Author(s):  
Masaki Yoshizawa ◽  
Shigeru Moriya ◽  
Hiroyuki Nakano ◽  
Yuichi Shirai ◽  
Tatsuo Morita ◽  
...  
Keyword(s):  
Electron Beam ◽  
Image Quality ◽  
Electron Beam Lithography ◽  
Line Edge Roughness ◽  
Latent Image ◽  
Edge Roughness ◽  
On Line

Simulation of amine concentration dependence on line edge roughness after development in electron beam lithography

2008 ◽  
Vol 104 (2) ◽  
pp. 024303 ◽  
Author(s):  
Akinori Saeki ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Heidi B. Cao ◽  
Hai Deng ◽  
...  
Keyword(s):  
Electron Beam ◽  
Concentration Dependence ◽  
Electron Beam Lithography ◽  
Line Edge Roughness ◽  
Amine Concentration ◽  
Edge Roughness ◽  
On Line
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