The impact of latent image quality on line edge roughness in electron beam lithography

2004 ◽  
Author(s):  
M. Yoshizawa ◽  
S. Moriya ◽  
H. Nakano ◽  
T. Morita ◽  
T. Kitagawa ◽  
...  
Keyword(s):  
Electron Beam ◽  
Image Quality ◽  
Electron Beam Lithography ◽  
Line Edge Roughness ◽  
Latent Image ◽  
Edge Roughness ◽  
On Line ◽  
The Impact

Impact of Latent Image Quality on Line Edge Roughness in Electron Beam Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3739-3743 ◽  
Author(s):  
Masaki Yoshizawa ◽  
Shigeru Moriya ◽  
Hiroyuki Nakano ◽  
Yuichi Shirai ◽  
Tatsuo Morita ◽  
...  
Keyword(s):  
Electron Beam ◽  
Image Quality ◽  
Electron Beam Lithography ◽  
Line Edge Roughness ◽  
Latent Image ◽  
Edge Roughness ◽  
On Line

Simulation of amine concentration dependence on line edge roughness after development in electron beam lithography

2008 ◽  
Vol 104 (2) ◽  
pp. 024303 ◽  
Author(s):  
Akinori Saeki ◽  
Takahiro Kozawa ◽  
Seiichi Tagawa ◽  
Heidi B. Cao ◽  
Hai Deng ◽  
...  
Keyword(s):  
Electron Beam ◽  
Concentration Dependence ◽  
Electron Beam Lithography ◽  
Line Edge Roughness ◽  
Amine Concentration ◽  
Edge Roughness ◽  
On Line

scholarly journals The Impact of Fluoropolymers on Line Edge Roughness in 193nm Imaging

2005 ◽  
Vol 18 (4) ◽  
pp. 467-469 ◽  
Author(s):  
F. C. Zumsteg ◽  
K. W. Leffew ◽  
A. E. Feiring ◽  
M. K. Crawsfored ◽  
W. B. Fahnham ◽  
...  
Keyword(s):  
Line Edge Roughness ◽  
Edge Roughness ◽  
On Line ◽  
The Impact
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