A Study of Sputtered TiN Gate Electrode Etching with Various Wet Chemicals and Post Etch Annealing for Complementary Metal–Oxide–Semiconductor Device Integration Applications

2012 ◽  
Vol 51 (10R) ◽  
pp. 101203 ◽  
Author(s):  
Seung Chan Heo ◽  
Dongjun Yoo ◽  
Moon Suk Choi ◽  
Dohyung Kim ◽  
Chulwon Chung ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Semiconductor Device ◽  
Complementary Metal Oxide Semiconductor ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Gate Electrode ◽  
Device Integration

Effective Metal Work Function of Pt Gate Electrode in Ge Metal Oxide Semiconductor Device

2010 ◽  
Vol 157 (5) ◽  
pp. H546 ◽  
Author(s):  
S. V. Jagadeesh Chandra ◽  
Mi-Ra Jeong ◽  
Kyu-Hwan Shim ◽  
Hyo-Bong Hong ◽  
Soo-Hyung Lee ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Work Function ◽  
Semiconductor Device ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Gate Electrode ◽  
Metal Work Function ◽  
Metal Work
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