Low-temperature formation ofc-axis-oriented aluminum nitride thin films by plasma-assisted reactive pulsed-DC magnetron sputtering

2017 ◽  
Vol 57 (1S) ◽  
pp. 01AD06 ◽  
Author(s):  
Kosuke Takenaka ◽  
Yoshikatsu Satake ◽  
Giichiro Uchida ◽  
Yuichi Setsuhara
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Nanostructured CrN thin films prepared by reactive pulsed DC magnetron sputtering

2010 ◽  
Vol 167 (1) ◽  
pp. 17-25 ◽  
Author(s):  
T. Elangovan ◽  
P. Kuppusami ◽  
R. Thirumurugesan ◽  
V. Ganesan ◽  
E. Mohandas ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Growth of transparent conducting nano-structured In doped ZnO thin films by pulsed DC magnetron sputtering

2008 ◽  
Vol 254 (8) ◽  
pp. 2250-2254 ◽  
Author(s):  
Young Ran Park ◽  
Eung Kwon Kim ◽  
Donggeun Jung ◽  
Tae Seok Park ◽  
Young Sung Kim
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Zno Thin Films ◽  
Dc Magnetron Sputtering ◽  
Transparent Conducting ◽  
Pulsed Dc ◽  
Doped Zno ◽  
Pulsed Dc Magnetron Sputtering

Titanium oxide thin films synthesis by pulsed – DC magnetron sputtering

Vacuum ◽  
2009 ◽  
Vol 83 ◽  
pp. S91-S94 ◽  
Author(s):  
Jurgita Čyvienė ◽  
Edvinas Navickas ◽  
Darius Milčius ◽  
Giedrius Laukaitis
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Oxide ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering
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