Characterization of Zinc Oxide Films Grown by a Newly Developed Plasma Enhanced MOCVD Employing Microwave Excited High Density Plasma

2007 ◽  
Author(s):  
Hirokazu Asahara ◽  
Atsutoshi Inokuchi ◽  
Kohei Watanuki ◽  
Masaki Hirayama ◽  
Akinobu Teramoto ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Oxide Films ◽  
High Density ◽  
Zinc Oxide Films ◽  
Density Plasma

High-density plasma etching of indium–zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

2006 ◽  
Vol 253 (5) ◽  
pp. 2752-2757 ◽  
Author(s):  
W.T. Lim ◽  
L. Stafford ◽  
Ju-Il Song ◽  
Jae-Soung Park ◽  
Y.W. Heo ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Plasma Etching ◽  
Oxide Films ◽  
High Density ◽  
Zinc Oxide Films ◽  
Indium Zinc Oxide ◽  
Density Plasma

Growth and characterization of zinc sulfide films by conversion of zinc oxide films with H2S

1989 ◽  
Vol 24 (10) ◽  
pp. 1215-1221 ◽  
Author(s):  
Y-M. Gao ◽  
P. Wu ◽  
J. Baglio ◽  
K. Dwight ◽  
A. Wold
Keyword(s):  
Zinc Oxide ◽  
Zinc Sulfide ◽  
Oxide Films ◽  
Zinc Oxide Films
Sign in / Sign up

Export Citation Format

Share Document