Ab initio study of aluminum chemical vapor deposition from dimethylaluminum hydride: a gas phase reaction mechanism

1999 ◽  
Vol 490 (1-3) ◽  
pp. 155-166 ◽  
Author(s):  
T Nakajima ◽  
K Yamashita
Keyword(s):  
Chemical Vapor Deposition ◽  
Reaction Mechanism ◽  
Ab Initio ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Phase Reaction ◽  
Ab Initio Study ◽  
Gas Phase Reaction ◽  
Dimethylaluminum Hydride

Modeling of the elementary gas‐phase reaction during chemical vapor deposition of silicon carbide from CH 3 SiCl 3 /H 2

2020 ◽  
Vol 52 (6) ◽  
pp. 359-367
Author(s):  
Noboru Sato ◽  
Yuichi Funato ◽  
Yasuyuki Fukushima ◽  
Takeshi Momose ◽  
Mitsuo Koshi ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Phase Reaction ◽  
Gas Phase Reaction
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