C4H14Al2 Dimethylaluminum hydride dimer

2005 ◽  
pp. 1-1
Author(s):  
G. Graner ◽  
E. Hirota ◽  
T. Iijima ◽  
K. Kuchitsu ◽  
D. A. Ramsay ◽  
...  
Keyword(s):  
Dimethylaluminum Hydride

Time-Dependent X-Ray Photoelectron Spectroscopy Observed for Dimethylaluminum Hydride Adsorbed onSiO2

1997 ◽  
Vol 36 (Part 1, No. 8) ◽  
pp. 5233-5236
Author(s):  
Hidetaka Koya ◽  
Mitsugu Hanabusa
Keyword(s):  
Photoelectron Spectroscopy ◽  
Time Dependent ◽  
X Ray ◽  
Dimethylaluminum Hydride

Surface chemistry of dimethylaluminum hydride and trimethylaluminum on polycrystalline aluminum

1991 ◽  
Vol 95 (3) ◽  
pp. 1329-1333 ◽  
Author(s):  
Daniel R. Strongin ◽  
Paul B. Comita
Keyword(s):  
Surface Chemistry ◽  
Polycrystalline Aluminum ◽  
Dimethylaluminum Hydride

Temperature dependence of decomposition pathway of dimethylaluminum hydride

1997 ◽  
Vol 181 (4) ◽  
pp. 437-440 ◽  
Author(s):  
Yasuo Matsumiya ◽  
Kazuo Nakajima
Keyword(s):  
Temperature Dependence ◽  
Decomposition Pathway ◽  
Dimethylaluminum Hydride

Photoinduced Selective Deposition of Aluminium Thin Film Using Dimethylaluminum Hydride

1991 ◽  
Vol 236 ◽  
Author(s):  
Mitsugu Hanabusa ◽  
Hideki Ouchi ◽  
Kenji Ishida ◽  
Masahiro Kawasaki ◽  
Satoshi Shogen
Keyword(s):  
Thin Film ◽  
Photoelectron Spectroscopy ◽  
Surface Reaction ◽  
Silicon Oxide ◽  
Film Growth ◽  
X Ray ◽  
Etched Silicon ◽  
Substrate Surfaces ◽  
Deuterium Lamp ◽  
Dimethylaluminum Hydride

AbstractAluminum thin film was deposited via a photochemical surface reaction of dimethylaluminum hydride (DMAH) using a deuterium lamp. The period required to initiate the film growth differed with substrate, and making use of this result the film could be grown preferentially on silicon nitride and silicon oxide layers rather than on wet-etched silicon. On the basis of an x-ray photoelectron spectroscopy the observed dependence of photodeposition on substrate surfaces can be attributed to how DMAH is chemisorbed initially.

Infrared reflection absorption spectra of trimethylaluminum and dimethylaluminum hydride condensed layers on an SiO2 surface with a buried metal layer substrate

1995 ◽  
Vol 352-353 ◽  
pp. 447-453 ◽  
Author(s):  
Yoshiaki Imaizumi ◽  
Yanping Zhang ◽  
Yoshiyuki Tsusaka ◽  
Tsuneo Urisu ◽  
Shinri Sato
Keyword(s):  
Absorption Spectra ◽  
Metal Layer ◽  
Sio2 Surface ◽  
Infrared Reflection ◽  
Dimethylaluminum Hydride

Patterned metal growth from dimethylaluminum hydride

1992 ◽  
Vol 10 (3) ◽  
pp. 1167 ◽  
Author(s):  
Nongfan Zhu
Keyword(s):  
Dimethylaluminum Hydride

Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride

1988 ◽  
Vol 27 (Part 2, No. 8) ◽  
pp. L1392-L1394 ◽  
Author(s):  
Mitsugu Hanabusa ◽  
Kikuo Hayakawa ◽  
Akira Oikawa ◽  
Katsunori Maeda
Keyword(s):  
Thin Films ◽  
Vapor Deposition ◽  
Photochemical Vapor Deposition ◽  
Dimethylaluminum Hydride

Kinetics and mechanism for the elimination of hydrogen between dimethylaluminum hydride and N-methylaniline

1979 ◽  
Vol 18 (11) ◽  
pp. 3188-3191 ◽  
Author(s):  
O. T. Beachley ◽  
Claire Tessier-Youngs
Keyword(s):  
Kinetics And Mechanism ◽  
Dimethylaluminum Hydride
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