Plasma Science and Technology - Basic Fundamentals and Modern Applications
Latest Publications

TOTAL DOCUMENTS

15

(FIVE YEARS 15)

H-INDEX

1

(FIVE YEARS 1)

Published By Intechopen

9781789852394, 9781789852400

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Noise-Free Rapid Approach to Solve Kinetic Equations for Hot Atoms in Fusion Plasmas

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.76681 ◽

2019 ◽

Author(s):

Mikhail Tokar

Keyword(s):

Kinetic Equations ◽

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Space Plasma Interactions with Spacecraft Materials

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.78306 ◽

2019 ◽

Author(s):

Daniel P. Engelhart ◽

Elena A. Plis ◽

Dale Ferguson ◽

W. Robert Johnston ◽

Russell Cooper ◽

...

Keyword(s):

Space Plasma ◽

Plasma Interactions

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Mode Transition and Hysteresis in Inductively Coupled Plasma Sources

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.76654 ◽

2019 ◽

Author(s):

Shu-Xia Zhao

Keyword(s):

Inductively Coupled Plasma ◽

Mode Transition ◽

Plasma Sources ◽

Inductively Coupled

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Modeling of Novel Plasma-Optical Systems

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.77512 ◽

2019 ◽

Author(s):

Iryna Litovko ◽

Alexey Goncharov

Keyword(s):

Optical Systems

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The Behavior of Streaming Instabilities in Dissipative Plasma

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.79247 ◽

2019 ◽

Author(s):

Eduard V. Rostomyan

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Numerical Approach to Dynamical Structure Factor of Dusty Plasmas

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.78334 ◽

2019 ◽

Author(s):

Aamir Shahzad ◽

Muhammad Asif Shakoori ◽

Mao-Gang HE ◽

Yan Feng

Keyword(s):

Structure Factor ◽

Numerical Approach ◽

Dusty Plasmas ◽

Dynamical Structure ◽

Dynamical Structure Factor

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Physics of High-Density Radio Frequency Capacitively Coupled Plasma with Various Electrodes and Its Applications

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.78387 ◽

2019 ◽

Author(s):

Yasunori Ohtsu

Keyword(s):

Radio Frequency ◽

High Density ◽

Capacitively Coupled ◽

Capacitively Coupled Plasma

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Repetitive Nanosecond Volume Discharges under Airflows

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.81919 ◽

2019 ◽

Author(s):

Jingfeng Tang ◽

Liqiu Wei ◽

Daren Yu

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Numerical Modeling of Partial Discharge Development Process

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.79215 ◽

2019 ◽

Author(s):

Cheng Pan ◽

Ju Tang ◽

Fuping Zeng

Keyword(s):

Numerical Modeling ◽

Development Process ◽

Partial Discharge

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Plasma Damage on Low-k Dielectric Materials

Plasma Science and Technology - Basic Fundamentals and Modern Applications ◽

10.5772/intechopen.79494 ◽

2019 ◽

Author(s):

Yi-Lung Cheng ◽

Chih-Yen Lee ◽

Chiao-Wei Haung

Keyword(s):

Dielectric Materials ◽

Plasma Damage ◽

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