Advances in Rapid Thermal and Integrated Processing
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Published By Springer Netherlands

9789048146963, 9789401587112

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Wafer Temperature Measurement in RTP

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_3 ◽

1996 ◽

pp. 103-123 ◽

Cited By ~ 4

Author(s):

Chuck Schietinger

Keyword(s):

Temperature Measurement ◽

Wafer Temperature

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Dielectric Photoformation on Si and SiGe

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_9 ◽

1996 ◽

pp. 235-264 ◽

Cited By ~ 1

Author(s):

Ian W. Boyd

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Integrated Pre-Gate Dielectric Cleaning and Surface Preparation

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_8 ◽

1996 ◽

pp. 217-234

Author(s):

Yi Ma ◽

Martin L. Green

Keyword(s):

Gate Dielectric ◽

Surface Preparation

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Wafer Emissivity In RTP

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_4 ◽

1996 ◽

pp. 125-141 ◽

Cited By ~ 3

Author(s):

Chuck Schietinger

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RTCVD Integrated Processing for Photovoltaic Application

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_14 ◽

1996 ◽

pp. 415-429

Author(s):

E. Conrad ◽

P. Müller ◽

A. Kermani

Keyword(s):

Photovoltaic Application ◽

Integrated Processing

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Modeling Approaches for Rapid Thermal Chemical Vapor Deposition

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_11 ◽

1996 ◽

pp. 305-331 ◽

Cited By ~ 1

Author(s):

K. F. Jensen ◽

H. Simka ◽

T. G. Mihopoulos ◽

P. Futerko ◽

M. Hierlemann

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thermal Chemical Vapor Deposition ◽

Modeling Approaches

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Equipment Design, Cluster Tools and Scale-Up Issues

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_15 ◽

1996 ◽

pp. 431-441 ◽

Cited By ~ 2

Author(s):

L. Deutschmann ◽

F. Glowacki

Keyword(s):

Scale Up ◽

Equipment Design ◽

Cluster Tools

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The Thermal Radiative Properties of Semiconductors

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_2 ◽

1996 ◽

pp. 35-101 ◽

Cited By ~ 39

Author(s):

P. J. Timans

Keyword(s):

Radiative Properties ◽

Thermal Radiative Properties

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Temperature and Process Control in Rapid Thermal Processing

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_5 ◽

1996 ◽

pp. 143-162 ◽

Cited By ~ 2

Author(s):

J.-M. Dilhac

Keyword(s):

Process Control ◽

Thermal Processing ◽

Rapid Thermal Processing

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Rapid Thermal O2-Oxidation and N2O-Oxynitridation

Advances in Rapid Thermal and Integrated Processing ◽

10.1007/978-94-015-8711-2_7 ◽

1996 ◽

pp. 193-215 ◽

Cited By ~ 1

Author(s):

Martin L. Green

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Advances in Rapid Thermal and Integrated ProcessingLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Springer Netherlands

Wafer Temperature Measurement in RTP

Dielectric Photoformation on Si and SiGe

Integrated Pre-Gate Dielectric Cleaning and Surface Preparation

Wafer Emissivity In RTP

RTCVD Integrated Processing for Photovoltaic Application

Modeling Approaches for Rapid Thermal Chemical Vapor Deposition

Equipment Design, Cluster Tools and Scale-Up Issues

The Thermal Radiative Properties of Semiconductors

Temperature and Process Control in Rapid Thermal Processing

Rapid Thermal O2-Oxidation and N2O-Oxynitridation

Advances in Rapid Thermal and Integrated Processing
Latest Publications