2014 International Workshop on Junction Technology (IWJT)
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9781479936274
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Effect of Ti interlayer on the formation of epitaxial NiSiGe on strained Si0.8Ge0.2

2014 ◽  
Author(s):  
C. Hou ◽  
Y. Ping ◽  
B. Zhang ◽  
W. Yu ◽  
Z. Xue ◽  
...  
Keyword(s):  
Strained Si

Extended defects in ion-implanted si during nanosecond laser annealing

2014 ◽  
Author(s):  
F. Cristiano ◽  
Y. Qiu ◽  
E. Bedel-Pereira ◽  
K. Huet ◽  
F. Mazzamuto ◽  
...  
Keyword(s):  
Laser Annealing ◽  
Nanosecond Laser ◽  
Extended Defects ◽  
Ion Implanted

scholarly journals Precision of single-engage micro Hall effect measurements

2014 ◽  
Author(s):  
Henrik H. Henrichsen ◽  
Ole Hansen ◽  
Daniel Kjaer ◽  
Peter F. Nielsen ◽  
Fei Wang ◽  
...  
Keyword(s):  
Hall Effect ◽  
Hall Effect Measurements

Monitoring of W accumulation in ion implanter beam line utilizing portable XRF instrument

2014 ◽  
Author(s):  
Y. Kawasaki ◽  
G. Fuse ◽  
M. Koike ◽  
E. Ooga ◽  
T. Morita ◽  
...  
Keyword(s):  
Beam Line ◽  
Portable Xrf

Formation and electrical properties of metal/Ge1−xSnx contacts

2014 ◽  
Author(s):  
Osamu Nakatsuka ◽  
Tsuyoshi Nishimura ◽  
Akihiro Suzuki ◽  
Kimihiko Kato ◽  
Deng Yunsheng ◽  
...  
Keyword(s):  
Electrical Properties
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