2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference
Latest Publications

TOTAL DOCUMENTS

(FIVE YEARS 0)

H-INDEX

(FIVE YEARS 0)

Published By IEEE

9781424419647

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

90nm Games Processor Wafer to Module Power Yield Optimization

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4529050 ◽

2008 ◽

Author(s):

Raymond Mallette ◽

Brad Rawlins

Keyword(s):

Yield Optimization ◽

Power Yield

Download Full-text

Real-time estimation and control of CD uniformity in lithography

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4529026 ◽

2008 ◽

Cited By ~ 1

Author(s):

Arthur Tay

Keyword(s):

Real Time ◽

Time Estimation ◽

Real Time Estimation ◽

Estimation And Control ◽

And Control

Download Full-text

Yield Optimization with Model Based DFM

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4529032 ◽

2008 ◽

Cited By ~ 3

Author(s):

Artur Balasinski ◽

Fedor Pikus ◽

Jan Bielawski

Keyword(s):

Yield Optimization ◽

Model Based

Download Full-text

Simulation on A Novel Ga-doped Phase Change Memory for Next Generation Embedded Non-Volatile Memory Application

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4529004 ◽

2008 ◽

Cited By ~ 1

Author(s):

Xiu-Lan Cheng ◽

Wen Yin ◽

Zhi-Gang Feng ◽

Tian-Yi Liang

Keyword(s):

Phase Change ◽

Phase Change Memory ◽

Next Generation ◽

Non Volatile Memory ◽

Volatile Memory ◽

Change Memory

Download Full-text

Advanced method to monitor design-process marginality for 65nm node and beyond

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4528996 ◽

2008 ◽

Author(s):

Hermes Liu ◽

Crockett Huang ◽

S F Tzou ◽

Chris Young ◽

David Tsui ◽

...

Keyword(s):

Design Process ◽

Advanced Method

Download Full-text

Characterization of Static-dissipative Ceramics for ESD and Contamination Control Purposes

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4529029 ◽

2008 ◽

Author(s):

Qiang Zhao ◽

Wayne C. Boone ◽

Raymond H. Bryden ◽

Oh-Hun Kwon

Keyword(s):

Contamination Control

Download Full-text

Minimizing Charging Potential during Passivation Etch

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4529054 ◽

2008 ◽

Author(s):

Yue Kok Hong Kenneth ◽

Tay Chin Tiong ◽

Se Kwang Leong James ◽

Goh Boon Kiat

Download Full-text

A Novel Advanced Process Control for Semiconductor Manufacturing: Dual Proximate Inverse System Feedback Control

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4529023 ◽

2008 ◽

Cited By ~ 1

Author(s):

Sheng Hua ◽

Xiu-Lan Cheng ◽

Tong-Dan Jin

Keyword(s):

Feedback Control ◽

Process Control ◽

Semiconductor Manufacturing ◽

Inverse System ◽

Advanced Process Control

Download Full-text

Getting Real with Real Time Dispatching in Metrology; an RTD Solution to Metrology's Imperceptible Cycle Time Impact

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4529060 ◽

2008 ◽

Cited By ~ 2

Author(s):

Preston L. Beaumont ◽

Ashley Goad ◽

Dominic Perira ◽

AG Qimonda ◽

Richmond

Keyword(s):

Real Time ◽

Cycle Time

Download Full-text

Lowering Cost of Ownership for Lithography Equipment

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference ◽

10.1109/asmc.2008.4529046 ◽

2008 ◽

Author(s):

Clarence Ademu-John ◽

Christopher Conley

Keyword(s):

Cost Of Ownership

Download Full-text

2008 IEEE/SEMI Advanced Semiconductor Manufacturing ConferenceLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

90nm Games Processor Wafer to Module Power Yield Optimization

Real-time estimation and control of CD uniformity in lithography

Yield Optimization with Model Based DFM

Simulation on A Novel Ga-doped Phase Change Memory for Next Generation Embedded Non-Volatile Memory Application

Advanced method to monitor design-process marginality for 65nm node and beyond

Characterization of Static-dissipative Ceramics for ESD and Contamination Control Purposes

Minimizing Charging Potential during Passivation Etch

A Novel Advanced Process Control for Semiconductor Manufacturing: Dual Proximate Inverse System Feedback Control

Getting Real with Real Time Dispatching in Metrology; an RTD Solution to Metrology's Imperceptible Cycle Time Impact

Lowering Cost of Ownership for Lithography Equipment

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference
Latest Publications