Metal-Organic Chemical Vapor Deposition of Metal Oxide Films and Nanostructures

2012 ◽  
pp. 291-336 ◽  
Author(s):  
Sanjay Mathur ◽  
Aadesh Pratap Singh ◽  
Ralf Müller ◽  
Tessa Leuning ◽  
Thomas Lehnen ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Metal Oxide ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Oxide Films ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Metal-Organic Chemical Vapor Deposition of Metal Oxide Films and Nanostructures

2014 ◽  
pp. 291-336 ◽  
Author(s):  
Sanjay Mathur ◽  
Aadesh Pratap Singh ◽  
Ralf Müller ◽  
Tessa Leuning ◽  
Thomas Lehnen ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Metal Oxide ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Oxide Films ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Ellipsometric Investigation of Metal-Organic Chemical Vapor Deposition of Niobium Oxide Films

1994 ◽  
Vol 363 ◽  
Author(s):  
Tobias Gerfin ◽  
Michael Graetzel
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Niobium Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Wavelength Dependence ◽  
Organic Chemical ◽  
Cauchy Type ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

AbstractNiobium oxide films have been prepared by metal-organic chemical vapor deposition (MOCVD) in two different systems via thermal decomposition of Nb(OEt)5.A detailed study by exsitu variable-angle spectroscopic ellipsometry indicates a wavelength dependence of the refractive index that could be described by a Cauchy type dispersion formula and typical values of 1.9 to 2.1 at 632.8nm. The band gap of these films were at about 3.5 and 4eV for the indirect and direct transition. Preliminary results of in-situ ellipsometry at four different wavelengths in the visible and UV will be discusssed. The films were amorphous, extremely smooth and pinhole free and therefore they are useful candidates for interdiffusion barrier layers.

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