Growth of bismuth oxide films by direct liquid injection-metal organic chemical vapor deposition with Bi(tmhd)3 (tmhd: 2,2,6,6-tetramethyl-3,5-heptanedione)

2004 ◽  
Vol 468 (1-2) ◽  
pp. 79-83 ◽  
Author(s):  
S.W. Kang ◽  
S.W. Rhee
Keyword(s):  
Chemical Vapor Deposition ◽  
Bismuth Oxide ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Liquid Injection ◽  
Metal Organic ◽  
Direct Liquid Injection ◽  
Organic Chemical Vapor Deposition

scholarly journals Alumina layer using low-cost direct liquid injection metal organic chemical vapor deposition (DLI-MOCVD) on AISI 1018 steel

2020 ◽  
Vol 18 (3) ◽  
Author(s):  
Javier Serrano Pérez ◽  
Fernando Juárez López ◽  
Edgar Serrano Pérez
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Liquid Injection ◽  
Metal Organic ◽  
Chamber Temperature ◽  
Direct Liquid Injection ◽  
Organic Chemical Vapor Deposition ◽  
Mocvd Technique

Amorphous alumina layers were deposited on low carbon steel (AISI 1018) substrates by the direct liquid injection metal organic chemical vapor deposition (DLI-MOCVD) technique. For the DLI- MOCVD technique, two temperatures were used: a vaporization chamber temperature of 180 °C and a reaction chamber temperature of 370 °C. Liquid precursor aluminum tri-sec-butoxide was introduced in form of atomized liquid, each pulse of 1 Hz frequency and 3 ms opening time, the solution was pressurized at 40 psi under inert Argon atmosphere. 200 sccm of Argon were used as continuous carrier gas during all the deposition process. Microscopy and XRD techniques were used to characterize the deposited material. The thickness of the alumina coatings was of 100 μm, approximately.

Characterizations of arsenic-doped zinc oxide films produced by atmospheric metal-organic chemical vapor deposition

2013 ◽  
Vol 277 ◽  
pp. 1-6 ◽  
Author(s):  
Li-Wei Weng ◽  
Wu-Yih Uen ◽  
Shan-Ming Lan ◽  
Sen-Mao Liao ◽  
Tsun-Neng Yang ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Zinc Oxide Films ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Metal-Organic Chemical Vapor Deposition of Metal Oxide Films and Nanostructures

2012 ◽  
pp. 291-336 ◽  
Author(s):  
Sanjay Mathur ◽  
Aadesh Pratap Singh ◽  
Ralf Müller ◽  
Tessa Leuning ◽  
Thomas Lehnen ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Metal Oxide ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Oxide Films ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Metal-Organic Chemical Vapor Deposition of Metal Oxide Films and Nanostructures

2014 ◽  
pp. 291-336 ◽  
Author(s):  
Sanjay Mathur ◽  
Aadesh Pratap Singh ◽  
Ralf Müller ◽  
Tessa Leuning ◽  
Thomas Lehnen ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Metal Oxide ◽  
Vapor Deposition ◽  
Oxide Films ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Oxide Films ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition
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