Nanoscale Film Thickness Gradients Printed in Open Air by Spatially Varying Chemical Vapor Deposition

2021 ◽  
pp. 2103271
Author(s):  
Abdullah H. Alshehri ◽  
Jhi Yong Loke ◽  
Viet Huong Nguyen ◽  
Alexander Jones ◽  
Hatameh Asgarimoghaddam ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Film Thickness ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Spatially Varying

Nanoscale Film Thickness Gradients Printed in Open Air by Spatially Varying Chemical Vapor Deposition

2021 ◽  
Vol MA2021-02 (29) ◽  
pp. 871-871
Author(s):  
Abdullah H. Alshehri ◽  
Jhi Loke ◽  
Viet Huong Nguyen ◽  
Alexander Jones ◽  
Hatameh Asgarimoghaddam ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Film Thickness ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Spatially Varying

scholarly journals Photocatalytic Activity of Hierarchically Structured TiO2Films Synthesized by Chemical Vapor Deposition

2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
Heon Lee ◽  
Sung Hoon Park ◽  
Young-Kwon Park ◽  
Sun-Jae Kim ◽  
Byung-Hoon Kim ◽  
...  
Keyword(s):  
Photocatalytic Activity ◽  
Chemical Vapor Deposition ◽  
Film Thickness ◽  
Hierarchical Structure ◽  
Vapor Deposition ◽  
Deposition Time ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Hierarchically structured TiO2photocatalyst films were synthesized using low-pressure metal-organic chemical vapor deposition (LPMOCVD) method to examine their photocatalytic activity. The thickness of the TiO2films increased proportionally with increasing deposition time. The TiO2film synthesized at 773 K showed a hierarchical structure composed of vertically grown laminar (112)-oriented anatase crystals. With increasing deposition time, the grain became larger and the morphology became sharper. In the initial CVD stage, small particular crystals were formed, above which sequential growth of layers of columnars with increasing size took place, forming hierarchical structure. The hierarchically structured TiO2film exhibited much higher photocatalytic activity than unhierarchically structured TiO2film. The photocatalytic activity increased with increasing film thickness.

Surface reaction probabilities of radicals correlated from film thickness contours in silane chemical vapor deposition

2002 ◽  
Vol 411 (2) ◽  
pp. 177-184 ◽  
Author(s):  
Dah-Shyang Tsai ◽  
Tzu-Chien Chang ◽  
Wei-Cheng Hsin ◽  
H Hamamura ◽  
Y Shimogaki
Keyword(s):  
Chemical Vapor Deposition ◽  
Film Thickness ◽  
Vapor Deposition ◽  
Surface Reaction ◽  
Chemical Vapor
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