Cuprous Ion Mass Transport Limitations During Copper Electrodeposition

2017 ◽  
Vol 4 (8) ◽  
pp. 1849-1851 ◽  
Author(s):  
Ralf Schmidt ◽  
Josef Gaida
Keyword(s):  
Mass Transport ◽  
Copper Electrodeposition ◽  
Cuprous Ion

Monitoring Cuprous Ion Transport by Scanning Electrochemical Microscopy during the Course of Copper Electrodeposition

2008 ◽  
Vol 155 (8) ◽  
pp. D538 ◽  
Author(s):  
Anthony P. O’Mullane ◽  
Aaron K. Neufeld ◽  
Alan M. Bond
Keyword(s):  
Ion Transport ◽  
Scanning Electrochemical Microscopy ◽  
Copper Electrodeposition ◽  
Cuprous Ion ◽  
Electrochemical Microscopy

Role of Cuprous Ion in Copper Electrodeposition Acceleration - a Rotating Ring Disk Study

2015 ◽  
Vol 64 (40) ◽  
pp. 35-40
Author(s):  
K. Nishimura ◽  
S. Matsuura ◽  
T. Hayashi ◽  
K. Kondo ◽  
M. Yokoi ◽  
...  
Keyword(s):  
Copper Electrodeposition ◽  
Cuprous Ion

Role of Cuprous Ion in Copper Electrodeposition Acceleration

2015 ◽  
Vol 162 (6) ◽  
pp. D199-D203 ◽  
Author(s):  
Taro Hayashi ◽  
Shogo Matsuura ◽  
Kazuo Kondo ◽  
Kentaro Kataoka ◽  
Kohei Nishimura ◽  
...  
Keyword(s):  
Copper Electrodeposition ◽  
Cuprous Ion

Voltammetric Observation of Transient Catalytic Behavior of SPS in Copper Electrodeposition—Its Interaction with Cuprous Ion from Comproportionation

2016 ◽  
Vol 163 (8) ◽  
pp. D428-D433 ◽  
Author(s):  
Sung Ki Cho ◽  
Hoe Chul Kim ◽  
Myung Jun Kim ◽  
Jae Jeong Kim
Keyword(s):  
Copper Electrodeposition ◽  
Catalytic Behavior ◽  
Cuprous Ion

An in Situ Stm Study of Cu and Ni Electrodeposition

1995 ◽  
Vol 404 ◽  
Author(s):  
T. P. Moffat
Keyword(s):  
Phosphoric Acid ◽  
Mass Transport ◽  
Nickel Deposition ◽  
Reaction Proceeding ◽  
Step Flow ◽  
Metal Lattice ◽  
Surface Steps ◽  
Transport Control ◽  
Cuprous Ion

AbstractAn STM study has been initiated to investigate the various processes associated with electrodeposition of Cu-Ni multilayers on Cu (100). The substrates were prepared by electropolishing in phosphoric acid followed by immersion in 10 mmol/l HCl. A (√2×√) R°45 adlattice of oxidatively adsorbed chlorine is formed under these conditions. The adlayer stabilizes the surface steps in the 〈100〉 direction which corresponds to the close packed direction of the chloride adlattice. In dilute mmo1/1 solutions of cuprous ion, reduction occurs under mass transport control with the electrocrystallization reaction proceeding by step flow in the 〈100〉 direction. At more negative potentials chloride is reductively desorbed. Coincident with desorption the highly kinked metal steps become frizzy and move towards adopting the close packed 〈110〉 orientation of the metal lattice. Preliminary experiments on heteroepitaxial nickel deposition reveal regions where electrocrystallization on Cu(100) occurs via step flow in the 〈110〉 direction.

Models of Thermodynamic Properties of Prominences

1979 ◽  
Vol 44 ◽  
pp. 349-355
Author(s):  
R.W. Milkey
Keyword(s):  
Thermodynamic Properties ◽  
Mass Transport ◽  
Emission Spectrum ◽  
Thermodynamic Parameters ◽  
Working Group ◽  
Physical Processes ◽  
Theoretical Concepts ◽  
Group 3 ◽  
Observational Techniques

The focus of discussion in Working Group 3 was on the Thermodynamic Properties as determined spectroscopically, including the observational techniques and the theoretical modeling of physical processes responsible for the emission spectrum. Recent advances in observational techniques and theoretical concepts make this discussion particularly timely. It is wise to remember that the determination of thermodynamic parameters is not an end in itself and that these are interesting chiefly for what they can tell us about the energetics and mass transport in prominences.

Sign in / Sign up

Export Citation Format

Share Document