Low-Pressure Chemical Vapor Deposition of Silicon Carbide Thin Films from Organopolysilanes

Hsin-Tien Chiu; Pei-Fang Wu

doi:10.1002/jccs.199100039

Low-Pressure Chemical Vapor Deposition of Silicon Carbide Thin Films from Organopolysilanes

Journal of the Chinese Chemical Society ◽

10.1002/jccs.199100039 ◽

1991 ◽

Vol 38 (3) ◽

pp. 231-234 ◽

Cited By ~ 4

Author(s):

Hsin-Tien Chiu ◽

Pei-Fang Wu

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical

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Low pressure chemical vapor deposition of silicon carbide thin films from hexamethyldisilane

Thin Solid Films ◽

10.1016/0040-6090(94)90818-4 ◽

1994 ◽

Vol 252 (1) ◽

pp. 13-18 ◽

Cited By ~ 18

Author(s):

Hsin-Tien Chiu ◽

Jen-Shiou Hsu

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical

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A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films

Advanced Engineering Materials ◽

10.1002/adem.201700193 ◽

2017 ◽

Vol 19 (8) ◽

pp. 1700193 ◽

Cited By ~ 2

Author(s):

Mattias Vervaele ◽

Bert De Roo ◽

Jolien Debehets ◽

Marilyne Sousa ◽

Luman Zhang ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Liquid Injection ◽

Pressure Chemical ◽

Direct Liquid Injection

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Summary Abstract: Comparative study of polycrystalline silicon thin films deposited by very low pressure chemical vapor deposition with and without plasma enhancement

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574482 ◽

1987 ◽

Vol 5 (4) ◽

pp. 1903-1904 ◽

Cited By ~ 1

Author(s):

J.‐J. J. Hajjar ◽

R. Reif ◽

D. Adler

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Thin Films ◽

Pressure Chemical ◽

Plasma Enhancement

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LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF TIN OXIDE THIN FILMS FROM AN ORGANOMETALLIC COMPOUND. APPLICATION TO GAS DETECTION

Journal de Physique IV (Proceedings) ◽

10.1051/jp4:1991237 ◽

1991 ◽

Vol 02 (C2) ◽

pp. C2-303-C2-310 ◽

Cited By ~ 1

Author(s):

C. PIJOLAT ◽

L. BRUNO ◽

R. LALAUZE

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Tin Oxide ◽

Vapor Deposition ◽

Organometallic Compound ◽

Chemical Vapor ◽

Low Pressure ◽

Gas Detection ◽

Oxide Thin Films ◽

Pressure Chemical

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Low-Pressure Chemical Vapor Deposition of Semi-insulating Polycrystalline Silicon Thin Films: I. Experimental Study and Proposal of New Kinetic Laws

Journal of The Electrochemical Society ◽

10.1149/1.1346601 ◽

2001 ◽

Vol 148 (3) ◽

pp. C149 ◽

Cited By ~ 4

Author(s):

P. Barathieu ◽

B. Caussat ◽

E. Scheid ◽

D. Jaume ◽

J. P. Couderc

Keyword(s):

Thin Films ◽

Experimental Study ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Thin Films ◽

Pressure Chemical

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Growth rate and deposition process of silicon carbide film by low-pressure chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(96)00415-0 ◽

1996 ◽

Vol 169 (3) ◽

pp. 485-490 ◽

Cited By ~ 3

Author(s):

Ken-ichi Murooka ◽

Iwao Higashikawa ◽

Yoshio Gomei

Keyword(s):

Growth Rate ◽

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Silicon Carbide Film ◽

Pressure Chemical

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Homoepitaxial growth of β-Ga2O3 thin films by low pressure chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.4948944 ◽

2016 ◽

Vol 108 (18) ◽

pp. 182105 ◽

Cited By ~ 101

Author(s):

Subrina Rafique ◽

Lu Han ◽

Marko J. Tadjer ◽

Jaime A. Freitas ◽

Nadeemullah A. Mahadik ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Homoepitaxial Growth ◽

Pressure Chemical

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Direct Liquid Injection − Low Pressure Chemical Vapor Deposition of Silica Thin Films from Di-t-butoxydiacetoxysilane

Advanced Engineering Materials ◽

10.1002/adem.201700425 ◽

2017 ◽

Vol 19 (12) ◽

pp. 1700425 ◽

Cited By ~ 1

Author(s):

Mattias Vervaele ◽

Bert De Roo ◽

Jolien Debehets ◽

Marilyne Sousa ◽

Luman Zhang ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silica Thin Films ◽

Liquid Injection ◽

Pressure Chemical ◽

Direct Liquid Injection

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ChemInform Abstract: A Two-Step Low Pressure Chemical Vapor Deposition Process for the Production of Tungsten Metal Thin Films.

ChemInform ◽

10.1002/chin.199838290 ◽

2010 ◽

Vol 29 (38) ◽

pp. no-no

Author(s):

D. V. BAXTER ◽

K. G. CAULTON ◽

M. H. CHISHOLM ◽

S.-H. CHUANG ◽

C. D. MINEAR

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Metal Thin Films ◽

Pressure Chemical ◽

Tungsten Metal

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Low Pressure Chemical Vapor Deposition of Silicon Carbide from Diethylsilane

Journal of The Electrochemical Society ◽

10.1149/1.2056172 ◽

1993 ◽

Vol 140 (3) ◽

pp. 851-854 ◽

Cited By ~ 16

Author(s):

J. M. Grow ◽

R. A. Levy ◽

Y. T. Shi ◽

R. L. Pfeffer

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical

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