Practical implementation of order parameter calculation for directed assembly of block copolymer thin films

2010 ◽  
Vol 48 (24) ◽  
pp. 2589-2603 ◽  
Author(s):  
Chi-Chun Liu ◽  
Gordon S. W. Craig ◽  
Huiman Kang ◽  
Ricardo Ruiz ◽  
Paul F. Nealey ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Order Parameter ◽  
Directed Assembly ◽  
Practical Implementation ◽  
Parameter Calculation

Directed Assembly of Nanoparticles in Block Copolymer Thin Films: Role of Defects

2010 ◽  
Vol 43 (24) ◽  
pp. 10452-10456 ◽  
Author(s):  
Jenny Kim ◽  
Peter F. Green
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Directed Assembly

Directed Assembly of Lamellae Forming Block Copolymer Thin Films near the Order–Disorder Transition

Nano Letters ◽  
2013 ◽  
Vol 14 (1) ◽  
pp. 148-152 ◽  
Author(s):  
Sangwon Kim ◽  
Paul F. Nealey ◽  
Frank S. Bates
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Directed Assembly ◽  
Disorder Transition

Study the Order of Morphology Self-Assembled Triblock Copolymer Thin Films by FFT of the AFM Images

2007 ◽  
Author(s):  
Yongzhi Cao ◽  
Shen Dong ◽  
Yingchun Liang ◽  
Tao Sun ◽  
Xuesen Zhao
Keyword(s):  
Thin Films ◽  
Fourier Transform ◽  
Block Copolymer ◽  
Fast Fourier Transform ◽  
Diffraction Pattern ◽  
Self Assembly ◽  
Order Parameter ◽  
Triblock Copolymer ◽  
Perfect System ◽  
Imperfect System

A variety of block copolymer thin films with well-ordered nanostructures, which can be employed as templates for nanotechnologies including nanostructure membranes, nanoparticle synthesis, photonic crystal, and high-density information storage media, can be realized simply and at low cost by self-assembly. Long range ordering of morphology is paramount to realize applications of self-assembled block copolymer thin films in nanotechnologies. A better understanding of what parameters affect the ordering process can lead to the production of highly ordered arrays of nanostructures. In this paper, in order to effectively analyze the improvement in ordering, the Fast Fourier transform (FFT) analysis of the AFM images is used. Fast Fourier transform provide a mathematical analysis of the image that is similar to producing a diffraction pattern. From this “diffraction pattern” information on the order in the system can be obtained. Moreover, calculating an ordering parameter from the FFT provides a quantitative measure of the order present in the polymer template. The order parameter is calculated using equations which were tested against a manufactured perfect system and imperfect system to ensure that a perfect system would provide an order parameter of 1 and an imperfect system would create an order parameter of 0. The results show that the method is reasonable and effective to analyze the improvement in ordering that is achieved by using solvent annealing. Furthermore, the method can be used to understand the parameters in triblock copolymer thin film self-assembly process that create the most well ordered system.

scholarly journals Defect Annihilation Pathways in Directed Assembly of Lamellar Block Copolymer Thin Films

ACS Nano ◽  
2018 ◽  
Vol 12 (10) ◽  
pp. 9974-9981 ◽  
Author(s):  
Su-Mi Hur ◽  
Vikram Thapar ◽  
Abelardo Ramírez-Hernández ◽  
Paul F. Nealey ◽  
Juan J. de Pablo
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Directed Assembly

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

2021 ◽  
Vol 13 (4) ◽  
pp. 5772-5781
Author(s):  
Dong Hyup Kim ◽  
Ahram Suh ◽  
Geonhyeong Park ◽  
Dong Ki Yoon ◽  
So Youn Kim
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Self Assembly

Controlling Domain Spacing and Grain Size in Cylindrical Block Copolymer Thin Films by Means of Thermal and Solvent Vapor Annealing

2016 ◽  
Vol 49 (9) ◽  
pp. 3373-3381 ◽  
Author(s):  
Xiaodan Gu ◽  
Ilja Gunkel ◽  
Alexander Hexemer ◽  
Thomas P. Russell
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Block Copolymer ◽  
Solvent Vapor ◽  
Vapor Annealing ◽  
Solvent Vapor Annealing ◽  
Cylindrical Block

scholarly journals Continuous Equilibrated Growth of Ordered Block Copolymer Thin Films by Electrospray Deposition

ACS Nano ◽  
2013 ◽  
Vol 7 (4) ◽  
pp. 2960-2970 ◽  
Author(s):  
Hanqiong Hu ◽  
Sofia Rangou ◽  
Myungwoong Kim ◽  
Padma Gopalan ◽  
Volkan Filiz ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Electrospray Deposition

Nanopatterning of ultrananocrystalline diamond thin films via block copolymer lithography

2010 ◽  
Vol 28 (4) ◽  
pp. 979-983 ◽  
Author(s):  
Muruganathan Ramanathan ◽  
Seth B. Darling ◽  
Anirudha V. Sumant ◽  
Orlando Auciello
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Ultrananocrystalline Diamond ◽  
Diamond Thin Films ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography

Structure of symmetric polyolefin block copolymer thin films

1992 ◽  
Vol 96 (11) ◽  
pp. 8605-8615 ◽  
Author(s):  
Mark D. Foster ◽  
Mohan Sikka ◽  
Navjot Singh ◽  
Frank S. Bates ◽  
Sushil K. Satija ◽  
...  
Keyword(s):  
Thin Films ◽  
Block Copolymer

Effect of Block Copolymer Architecture on the Thermally Induced Swelling of Micelle-Containing Multilayer Thin Films

2011 ◽  
Vol 44 (19) ◽  
pp. 7767-7774 ◽  
Author(s):  
Wui Siew Tan ◽  
Zhichen Zhu ◽  
Svetlana A. Sukhishvili ◽  
Michael F. Rubner ◽  
Robert E. Cohen
Keyword(s):  
Thin Films ◽  
Block Copolymer ◽  
Multilayer Thin Films ◽  
Thermally Induced
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