Summary of ISO/TC 201 Technical Report: ISO/TR 19319:2013 - Surface chemical analysis - Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods

M. Senoner; W. E. S. Unger

doi:10.1002/sia.5294

Summary of ISO/TC 201 Technical Report: ISO/TR 19319:2013 - Surface chemical analysis - Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods

Surface and Interface Analysis ◽

10.1002/sia.5294 ◽

2013 ◽

Vol 45 (9) ◽

pp. 1313-1316 ◽

Cited By ~ 11

Author(s):

M. Senoner ◽

W. E. S. Unger

Keyword(s):

Chemical Analysis ◽

Lateral Resolution ◽

Surface Chemical ◽

Technical Report ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution

10.3403/30124110 ◽

2006 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Lateral Resolution ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution

10.3403/30124110u ◽

2015 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Lateral Resolution ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis. Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods

10.3403/30219240 ◽

2013 ◽

Keyword(s):

Chemical Analysis ◽

Lateral Resolution ◽

Surface Chemical ◽

Surface Chemical Analysis

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Summary of ISO/TC 201 Standard: XXX. ISO 18516: 2006-Surface chemical analysis-Auger electron spectroscopy and X-ray photoelectron spectroscopy-Determination of lateral resolution

Surface and Interface Analysis ◽

10.1002/sia.2771 ◽

2008 ◽

Vol 40 (5) ◽

pp. 966-968 ◽

Cited By ~ 10

Author(s):

J. Wolstenholme

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Lateral Resolution ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Summary of ISO/TC 201 Technical Report: ISO/TR 19319: 2003—Surface chemical analysis—Auger electron spectroscopy and x-ray photoelectron spectroscopy—Determination of lateral resolution, analysis area and sample area viewed by the analyser

Surface and Interface Analysis ◽

10.1002/sia.1906 ◽

2004 ◽

Vol 36 (7) ◽

pp. 666-667 ◽

Cited By ~ 5

Author(s):

C. J. Powell

Keyword(s):

Chemical Analysis ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Technical Report ◽

Resolution Analysis ◽

Surface Chemical Analysis

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Summary of ISO/TC 201 International Standard ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam‐based methods with a range from nanometres to micrometres and its implementation for imaging laboratory X‐ray photoelectron spectrometers (XPS)

Surface and Interface Analysis ◽

10.1002/sia.7025 ◽

2021 ◽

Author(s):

Wolfgang E. S. Unger ◽

Mathias Senoner ◽

Jörg M. Stockmann ◽

Vincent Fernandez ◽

Neal Fairley ◽

...

Keyword(s):

Chemical Analysis ◽

Lateral Resolution ◽

Surface Chemical ◽

X Ray ◽

International Standard ◽

Surface Chemical Analysis ◽

Analysis Determination

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Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

10.3403/02007712 ◽

2000 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Secondary Ion Mass Spectrometry ◽

Surface Chemical ◽

Atomic Concentration ◽

Ion Mass Spectrometry ◽

Doped Materials ◽

Secondary Ion ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution, analysis area, and sample area viewed by the analyser

10.3403/30124424 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Resolution Analysis ◽

Surface Chemical Analysis

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Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

10.3403/30153671 ◽

2010 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Secondary Ion Mass Spectrometry ◽

Surface Chemical ◽

Atomic Concentration ◽

Ion Mass Spectrometry ◽

Doped Materials ◽

Secondary Ion ◽

Surface Chemical Analysis

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Surface chemical analysis. Scanning-probe microscopy. Definition and calibration of the lateral resolution of a near-field optical microscope

10.3403/30165037 ◽

2011 ◽

Keyword(s):

Chemical Analysis ◽

Scanning Probe Microscopy ◽

Near Field ◽

Optical Microscope ◽

Scanning Probe ◽

Lateral Resolution ◽

Surface Chemical ◽

Probe Microscopy ◽

Surface Chemical Analysis

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