3D Shape Engineering and Design Parameterization

2011 ◽  
Vol 8 (5) ◽  
pp. 681-692 ◽  
Author(s):  
Kuang-Hua Chang ◽  
Chienchih Chen
Keyword(s):  
3D Shape ◽  
Design Parameterization

Topology Optimization of Micromachined Structures With the Manufacturing Constraints of KOH Etching of (110) Silicon

2008 ◽  
Author(s):  
Sudarshan Hegde ◽  
G. K. Ananthasuresh
Keyword(s):  
Topology Optimization ◽  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Cost Effective ◽  
Wet Etching ◽  
Minimum Length ◽  
The Cost ◽  
Design Parameterization ◽  
Koh Etching ◽  
Si Wafer

The focus of this paper is on designing useful compliant micro-mechanisms of high-aspect-ratio which can be microfabricated by the cost-effective wet etching of (110) orientation silicon (Si) wafers. Wet etching of (110) Si imposes constraints on the geometry of the realized mechanisms because it allows only etch-through in the form of slots parallel to the wafer’s flat with a certain minimum length. In this paper, we incorporate this constraint in the topology optimization and obtain compliant designs that meet the specifications on the desired motion for given input forces. Using this design technique and wet etching, we show that we can realize high-aspect-ratio compliant micro-mechanisms. For a (110) Si wafer of 250 μm thickness, the minimum length of the etch opening to get a slot is found to be 866 μm. The minimum achievable width of the slot is limited by the resolution of the lithography process and this can be a very small value. This is studied by conducting trials with different mask layouts on a (110) Si wafer. These constraints are taken care of by using a suitable design parameterization rather than by imposing the constraints explicitly. Topology optimization, as is well known, gives designs using only the essential design specifications. In this work, we show that our technique also gives manufacturable mechanism designs along with lithography mask layouts. Some designs obtained are transferred to lithography masks and mechanisms are fabricated on (110) Si wafers.

Design Parameterization

e-Design ◽  
2015 ◽  
pp. 233-263
Author(s):  
Kuang-Hua Chang
Keyword(s):  
Design Parameterization

Application of Robust Design Approach for Design Parameterization in Kansei Engineering

2012 ◽  
Vol 479-481 ◽  
pp. 1670-1680 ◽  
Author(s):  
Sugoro Bhakti Sutono ◽  
Zahari Taha ◽  
Salwa Hanim Abdul Rashid ◽  
Hideki Aoyama ◽  
Subagyo Subagyo
Keyword(s):  
Robust Design ◽  
Orthogonal Array ◽  
Design Approach ◽  
Design Parameters ◽  
Shape Parameters ◽  
Design Support System ◽  
Emotional Value ◽  
Design Parameterization ◽  
Significant Factors

Nowadays, consumers have become more selective in choosing products not only deciding based on its functionality and its value but also on its aesthetic and emotional value. Aesthetic and emotional values have thus become important aspects in the success of a product in a competitive market. Consequently, recognizing the primary parameters used to generate combinative product shape which has the ability to evoke a particular emotion should be given strong consideration. This paper describes the application of robust design approach which allows the designer to determine the optimal design parameters to obtain form impression evoked by a product shape feature. A Taguchi’s orthogonal array method is applied to design the experiment and is analyzed to obtain the optimal parameters for each factor. ANOVA is then employed to identify the most significant factors. A Taguchi’s L18orthogonal array was adopted for an experiment on the design of an office chair. The case study contains six three-level factors, and 18 different combinative design samples created from shape parameters. The results of the experiment shows that it is possible to create a design support system that can facilitates the designer in the creative process by suggesting shape parameters relating to a specific form impression.

scholarly journals Capturing emotions in voice: A comparative analysis of methodologies in psychology and digital signal processing

2019 ◽  
Vol 22 (1) ◽  
pp. 15-34
Author(s):  
Daniela Hekiert ◽  
Magdalena Igras-Cybulska
Keyword(s):  
Signal Processing ◽  
Comparative Analysis ◽  
Digital Signal Processing ◽  
Vocal Communication ◽  
Digital Signal ◽  
Database Design ◽  
Vocal Affect ◽  
Design Parameterization ◽  
Insight Into

People use their voices to communicate not only verbally but also emotionally. This article presents theories and methodologies that concern emotional vocalizations at the intersection of psychology and digital signal processing. Specifically, it demonstrates the encoding (production) and decoding (recognition) of emotional sounds, including the review and comparison of strategies in database design, parameterization, and classification. Whereas psychology predominantly focuses on the subjective recognition of emotional vocalizations, digital signal processing relies on automated and thus more objective vocal affect measures. The article aims to compare these two approaches and suggest methods of combining them to achieve a more complex insight into the vocal communication of emotions.

An Optimality Criteria Approach for the Topology Synthesis of Compliant Mechanisms

1998 ◽  
Author(s):  
A. Saxena ◽  
G. K. Ananthasuresh
Keyword(s):  
Energy Density ◽  
Mathematical Programming ◽  
Objective Function ◽  
Compliant Mechanisms ◽  
Optimality Criteria ◽  
Optimality Criteria Method ◽  
New Energy ◽  
Method Of Solution ◽  
Design Parameterization ◽  
The Continuum

Abstract The physical insight used in formulating a multi-criteria optimization problem for the synthesis of compliant mechanisms, is quickly lost if mathematical programming techniques (SLP, SQP etc.) are used to determine the optimal solution. As opposed to the previous works that relied upon mathematical programming search techniques to find the optimum solution, in this paper we present an alternative method of solution called the optimality criteria method. Optimality criteria methods have proven to be effective in structural optimization problems with a large number of variables, and very few constraints as is the case in the topology synthesis of compliant mechanisms. The important new results of this paper include: (i) the derivation of a physically insightful optimal property of compliant mechanisms which states that the ratio of the mutual potential energy density and the strain energy density is uniform throughout the continuum (ii) the development of the optimality criteria method of solution in the form of a simple update formula for the design variables by using the above property (iii) design parameterization using the frame finite-element based ground-structure that appropriately accounts for the requisite bending behavior in the continuum, and (iv) numerical implementation of previously reported density based design parameterization using bilinear plane-stress elements. In addition, a new energy based multi-criteria objective function is presented to maximize the useful output energy (which is equivalent to maximizing the mechanical advantage) while meeting the kinematic requirements. Several examples are included to demonstrate the validity of the optimal property, the optimality-criteria method of solution, and the improvements made possible by the new energy based objective function.

Topology Optimization of Micromachined Structures With Surface Micromachining Manufacturing Constraints

2006 ◽  
Author(s):  
Aravind Alwan ◽  
G. K. Ananthasuresh
Keyword(s):  
Topology Optimization ◽  
Optimization Methods ◽  
Manufacturing Cost ◽  
Manufacturing Constraints ◽  
Surface Micromachining ◽  
Out Of Plane ◽  
Gradient Based ◽  
Plane Direction ◽  
New Formulation ◽  
Design Parameterization

Topology optimization methods have been shown to have extensive application in the design of microsystems. However, their utility in practical situations is restricted to predominantly planar configurations due to the limitations of most microfabrication techniques in realizing structures with arbitrary topologies in the direction perpendicular to the substrate. This study addresses the problem of synthesizing optimal topologies in the out-of-plane direction while obeying the constraints imposed by surface micromachining. A new formulation that achieves this by defining a design space that implicitly obeys the manufacturing constraints with a continuous design parameterization is presented in this paper. This is in contrast to including manufacturing cost in the objective function or constraints. The resulting solutions of the new formulation obtained with gradient-based optimization directly provide the photolithographic mask layouts. Two examples that illustrate the approach for the case of stiff structures are included.

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