CIGS thin film Deposition by Dual Ion Beam Sputtering (DIBS) system for Solar cell Applications

2014 ◽  
pp. 399-401
Author(s):  
Shaibal Mukherjee ◽  
Vishnu Awasthi ◽  
Sushil K. Pandey ◽  
Saurabh K. Pandey ◽  
Shruti Verma ◽  
...  
Keyword(s):  
Thin Film ◽  
Solar Cell ◽  
Ion Beam ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Ion Beam Sputtering ◽  
Cigs Thin Film ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Controlled thin-film deposition of α or β Ga2O3 by ion-beam sputtering

2020 ◽  
Vol 38 (6) ◽  
pp. 063412
Author(s):  
Martin Becker ◽  
Sebastian L. Benz ◽  
Limei Chen ◽  
Angelika Polity ◽  
Peter J. Klar ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

TiOxCy Thin Film Deposition by CO2+-Ion Beam Sputtering of Titanium

1993 ◽  
Vol 316 ◽  
Author(s):  
BERTILO E. KEMPF
Keyword(s):  
Near Infrared ◽  
Ion Beam ◽  
Thin Film Deposition ◽  
Ion Source ◽  
Film Deposition ◽  
Refractive Indices ◽  
Ion Beam Sputtering ◽  
Infrared Wavelength ◽  
Beam Sputtering ◽  
Current Densities

ABSTRACTTitanium metal is sputtered by ion beams using a Kaufman-type ion source with carbondioxide as working gas. Deposition takes place on watercooled substrates of silicon and InP. The films obtained are amorphous; they adhere excellently. SEM-pictures reveal a featureless dense fracture and a smooth surface. Despite a carbon content of 9 at % the films are highly transparent in the visible and near infrared wavelength range. Refractive indices center around 2.15 at values typically found for amorphous TiO2. The electrical properties are characterized by dielectric constant of ε = 26 ± 3, leakage current densities at breakdown of jL = 3.65 . 10-3 A/cm2 and breakdown fields EB > 1 MeV/cm.

Deposition Characteristics of AlN Thin Film Prepared by the Dual Ion Beam Sputtering System

2006 ◽  
Vol 36 (1) ◽  
pp. 81-87 ◽  
Author(s):  
T. L. Hu ◽  
S. W. Mao ◽  
C. P. Chao ◽  
M. F. Wu ◽  
H. L. Huang ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Sputtering System

Microstructure and Young's modulus of ZrN thin film prepared by dual ion beam sputtering deposition

2019 ◽  
Vol 374 ◽  
pp. 997-1005 ◽  
Author(s):  
Fei Zhu ◽  
Kangwei Zhu ◽  
Yin Hu ◽  
Yunhan Ling ◽  
Dong Wang ◽  
...  
Keyword(s):  
Thin Film ◽  
Young’S Modulus ◽  
Young's Modulus ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Sputtering Deposition ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering
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