Performance of Thin-Film Transistors Fabricated from Undoped Low Pressure Chemical Vapour Deposited Polycrystalline Silicon in Relation to the Growth Pressure

Influence of deposition pressure on the bulk and interface states in low pressure chemical vapor deposited polycrystalline silicon thin‐film transistors

10.1063/1.111473 ◽

1994 ◽

Vol 64 (20) ◽

pp. 2709-2711 ◽

Cited By ~ 6

Author(s):

C. A. Dimitriadis ◽

D. H. Tassis ◽

N. A. Economou ◽

G. Giakoumakis

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Low Pressure ◽

Interface States ◽

Deposition Pressure ◽

Silicon Thin Film ◽

Effects of temperature and electrical stress on the performance of thin‐film transistors fabricated from undoped low‐pressure chemical vapor deposited polycrystalline silicon

10.1063/1.100897 ◽

1989 ◽

Vol 54 (7) ◽

pp. 620-622 ◽

Cited By ~ 33

Author(s):

C. A. Dimitriadis ◽

P. A. Coxon

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Low Pressure ◽

Electrical Stress ◽

Pressure Chemical ◽

Effects Of Temperature

Influence of deposition pressure on the output characteristics of low pressure chemical vapor deposited polycrystalline silicon thin‐film transistors

10.1063/1.109852 ◽

1993 ◽

Vol 63 (7) ◽

pp. 943-945 ◽

Cited By ~ 6

Author(s):

C. A. Dimitriadis ◽

P. A. Coxon ◽

N. A. Economou

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Low Pressure ◽

Deposition Pressure ◽

Silicon Thin Film ◽

Pressure Chemical ◽

Output Characteristics

Effect of pressure on the growth of the crystallites of low pressure chemical vapour deposited polycrystalline silicon films and the effective electron mobility under high normal field in thin film transistors

Acta Physica Hungarica ◽

10.1007/bf03055247 ◽

1994 ◽

Vol 74 (1-2) ◽

pp. 155-160

Author(s):

C. A. Dimitriadis ◽

J. Stoemenos ◽

P. A. Coxon ◽

S. Friligkos ◽

J. Antonopoulos ◽

...

Keyword(s):

Thin Film ◽

Electron Mobility ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Chemical Vapour ◽

Effective Electron ◽

Effect Of Pressure ◽

Normal Field ◽

Pressure Chemical ◽

Polycrystalline Silicon Films

Stress in low pressure chemical vapour deposition polycrystalline silicon thin films deposited below 0.1 Torr

Sensors and Actuators A Physical ◽

10.1016/0924-4247(93)80122-w ◽

1993 ◽

Vol 37-38 ◽

pp. 723-726 ◽

Cited By ~ 11

Author(s):

A. Benitez ◽

J. Bausells ◽

E. Cabruja ◽

J. Esteve ◽

J. Samitier

Keyword(s):

Thin Films ◽

Polycrystalline Silicon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Thin Films ◽

Semi-Insulating Polycrystalline Silicon by Low Pressure Chemical Vapour Deposition from Disilane and Nitrous Oxide

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.4666 ◽

1995 ◽

Vol 34 (Part 1, No. 9A) ◽

pp. 4666-4672 ◽

Cited By ~ 5

Author(s):

Eric Dehan ◽

Juan Jose Pedroviejo ◽

EmmanuelScheid ◽

Joan Ramon Morante

Keyword(s):

Nitrous Oxide ◽

Polycrystalline Silicon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Performance of thin-film transistors on polysilicon films grown by low-pressure chemical vapor deposition at various pressures

IEEE Transactions on Electron Devices ◽

10.1109/16.123484 ◽

1992 ◽

Vol 39 (3) ◽

pp. 598-606 ◽

Cited By ~ 102

Author(s):

C.A. Dimitriadis ◽

P.A. Coxon ◽

L. Dozsa ◽

L. Papadimitriou ◽

N. Economou

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Thin Film Transistors ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical ◽

Polysilicon Films

Low Pressure Chemical Vapour Deposition as a Tool for Deposition of Thin Film Battery Materials

ECS Meeting Abstracts ◽

10.1149/ma2009-02/34/2567 ◽

2009 ◽

Keyword(s):

Thin Film ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Battery Materials ◽

Thin Film Battery ◽

The growth of polycrystalline silicon films by low pressure chemical vapour deposition at relatively low temperatures

Thin Solid Films ◽

10.1016/0040-6090(88)90431-2 ◽

1988 ◽

Vol 163 ◽

pp. 249-254 ◽

Cited By ~ 2

Author(s):

D. Meakin ◽

P. Migliorato ◽

J. Stoemenos ◽

N.A. Economou

Keyword(s):

Low Temperatures ◽

Polycrystalline Silicon ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Films ◽

Pressure Chemical ◽

Polycrystalline Silicon Films

Low-frequency noise of the leakage current in undoped low-pressure chemical vapor deposited polycrystalline silicon thin-film transistors

10.1063/1.118239 ◽

1997 ◽

Vol 70 (7) ◽

pp. 880-882 ◽

Cited By ~ 3

Author(s):

C. A. Dimitriadis ◽

J. Brini ◽

G. Kamarinos

Keyword(s):

Thin Film ◽

Leakage Current ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Low Frequency ◽

Chemical Vapor ◽

Frequency Noise ◽

Silicon Thin Film ◽