Microstructural Analysis of Electronically Conductive Ceramic Coatings Synthesized by Reactive ION Plating and Sputter Deposition

Author(s):  
L. D. Stephenson ◽  
V. F. Hock ◽  
J. M. Rigsbee ◽  
D. Teer ◽  
D. Arnell
Author(s):  
H. Ahn ◽  
S.H. Hong

Abstract Graded metal-to-ceramic coatings as thermal barrier coating (TBC) have been studied to improve the surface properties of the coating on high-temperature components. The atmospheric and low pressure plasma spray experiments are carried out with partially stabilized zirconia (YSZ and MSZ) and MCrAlY for mixing of functionally gradient materials. Especially, three-layer and five-layer graded TBCs are designed and produced to match gradually the material properties of a substrate and a top coating for reducing thermal stresses. A fiilly-saturated fractional factorial test is employed to determine optimum process conditions related to the thermal plasma generation, powder feeding, and substrate handling. Microstructural analysis using optical microscope and SEM, compositional analysis by XRD, bond strength test and thermal shock tests are carried out for material evaluation of fabricated TBCs. According to the results of material evaluation, the spray process is optimized for improving coating quality, and the proper raw materials are selected as a result of microstructural analysis. Especially, it is found that the durability and strain tolerance to thermal shock are remarkably increased by the gradation of TBCs and the improvement of graded TBC results from the fracture mechanism related to the vertical crack.


1981 ◽  
Vol 59 (1) ◽  
pp. 123-126 ◽  
Author(s):  
A. Matthews ◽  
D. G. Teer ◽  
J. Halling

2018 ◽  
Vol 27 (3) ◽  
pp. 371-378 ◽  
Author(s):  
Hsin Wang ◽  
Govindarajan Muralidharan ◽  
Donovan N. Leonard ◽  
J. Allen Haynes ◽  
Wallace D. Porter ◽  
...  

1992 ◽  
Vol 102-104 ◽  
pp. 599-614 ◽  
Author(s):  
J.P. Celis ◽  
J.R. Roos ◽  
E. Vancoille ◽  
S. Boelens ◽  
J. Ebberink

2021 ◽  
Vol 199 ◽  
pp. 109430
Author(s):  
Benjamin K. Derby ◽  
Terry G. Holesinger ◽  
James A. Valdez ◽  
Blas P. Uberuaga ◽  
Cortney R. Kreller

Author(s):  
K.R. Subramanian ◽  
A.H. King ◽  
H. Herman

Plasma spraying is a technique which is used to apply coatings to metallic substrates for a variety of purposes, including hardfacing, corrosion resistance and thermal barrier applications. Almost all of the applications of this somewhat esoteric fabrication technique involve materials in hostile environments and the integrity of the coatings is of paramount importance: the effects of process variables on such properties as adhesive strength, cohesive strength and hardness of the substrate/coating system, however, are poorly understood.Briefly, the plasma spraying process involves forming a hot plasma jet with a maximum flame temperature of approximately 20,000K and a gas velocity of about 40m/s. Into this jet the coating material is injected, in powder form, so it is heated and projected at the substrate surface. Relatively thick metallic or ceramic coatings may be speedily built up using this technique.


Author(s):  
C. M. Jantzen ◽  
D. G. Howitt

The mullite-SiO2 liquidus has been extensively studied, and it has been shown that the flattening of the liquidus is related to the existence of a metastable region of liquid immiscibility at sub-liquidus temperatures which is detectable by transmission electron microscopy (TEM) (Fig. 1).


Author(s):  
M. G. Lagally

It has been recognized since the earliest days of crystal growth that kinetic processes of all Kinds control the nature of the growth. As the technology of crystal growth has become ever more refined, with the advent of such atomistic processes as molecular beam epitaxy, chemical vapor deposition, sputter deposition, and plasma enhanced techniques for the creation of “crystals” as little as one or a few atomic layers thick, multilayer structures, and novel materials combinations, the need to understand the mechanisms controlling the growth process is becoming more critical. Unfortunately, available techniques have not lent themselves well to obtaining a truly microscopic picture of such processes. Because of its atomic resolution on the one hand, and the achievable wide field of view on the other (of the order of micrometers) scanning tunneling microscopy (STM) gives us this opportunity. In this talk, we briefly review the types of growth kinetics measurements that can be made using STM. The use of STM for studies of kinetics is one of the more recent applications of what is itself still a very young field.


Author(s):  
M. A. Kirk ◽  
M. C. Baker ◽  
B. J. Kestel ◽  
H. W. Weber

It is well known that a number of compound superconductors with the A15 structure undergo a martensite transformation when cooled to the superconducting state. Nb3Sn is one of those compounds that transforms, at least partially, from a cubic to tetragonal structure near 43 K. To our knowledge this transformation in Nb3Sn has not been studied by TEM. In fact, the only low temperature TEM study of an A15 material, V3Si, was performed by Goringe and Valdre over 20 years ago. They found the martensite structure in some foil areas at temperatures between 11 and 29 K, accompanied by faults that consisted of coherent twin boundaries on {110} planes. In pursuing our studies of irradiation defects in superconductors, we are the first to observe by TEM a similar martensite structure in Nb3Sn.Samples of Nb3Sn suitable for TEM studies have been produced by both a liquid solute diffusion reaction and by sputter deposition of thin films.


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