Microwave and Dual-Frequency Plasma Processing
High-Performance SiOF Film Fabricated Using a Dual-Frequency-Plasma Chemical Vapor Deposition system
2004 ◽
Vol 43
(9A)
◽
pp. 5984-5989
◽
1992 ◽
Vol 139
(12)
◽
pp. 3587-3595
◽
2004 ◽
Vol 37
(5)
◽
pp. 697-701
◽
Keyword(s):
1993 ◽
Vol 58
(1)
◽
pp. 45-55
◽