Limiting equilibrium state of a layer weakened by a system of parallel cracks, round in a plan view

1977 ◽  
Vol 12 (5) ◽  
pp. 518-522
Author(s):  
A. E. Andreikiv
Keyword(s):  
Equilibrium State ◽  
Plan View ◽  
Parallel Cracks ◽  
Limiting Equilibrium

Limiting equilibrium state of an infinite plate with a cut along the arc of a circle

1976 ◽  
Vol 8 (9) ◽  
pp. 1061-1064
Author(s):  
E. V. Buina ◽  
T. R. Yas'kevich
Keyword(s):  
Equilibrium State ◽  
Infinite Plate ◽  
Limiting Equilibrium

Energy Approach to the Evaluation of the Limiting Equilibrium State of Orthotropic Cracked Bodies

2004 ◽  
Vol 40 (5) ◽  
pp. 629-634
Author(s):  
M. M. Hvozdyuk ◽  
O. V. Hembara
Keyword(s):  
Equilibrium State ◽  
Energy Approach ◽  
Limiting Equilibrium

Certain cases of the limiting equilibrium of a plate with an arbitrary boundary in plan view

1971 ◽  
Vol 7 (1) ◽  
pp. 60-65
Author(s):  
V. V. Al'pert
Keyword(s):  
Plan View ◽  
Arbitrary Boundary ◽  
Limiting Equilibrium

scholarly journals On the limiting equilibrium state of a nonlinear anisotropic body with a crack

2015 ◽  
pp. 52-60
Author(s):  
A.A. Kaminsky ◽  
◽  
E.E. Kurchakov ◽  
Keyword(s):  
Equilibrium State ◽  
Anisotropic Body ◽  
Limiting Equilibrium

scholarly journals Coupling Analyses of Limiting Equilibrium State for Normally Consolidated and Lightly Overconsolidated Soils

1990 ◽  
Vol 30 (3) ◽  
pp. 109-123 ◽  
Author(s):  
Akira Asaoka ◽  
Satoru Ohtsuka ◽  
Minoru Matsuo
Keyword(s):  
Equilibrium State ◽  
Limiting Equilibrium ◽  
Overconsolidated Soils

In situ observations of electromigration induced void behavior

1995 ◽  
Vol 53 ◽  
pp. 244-245
Author(s):  
T. Marieb ◽  
J. C. Bravman ◽  
P. Flinn ◽  
D. Gardner ◽  
M. Madden
Keyword(s):  
Electron Microscopy ◽  
Void Nucleation ◽  
Plan View ◽  
Transmission Electron ◽  
Nucleation Sites ◽  
Microelectronics Industry ◽  
In Situ Observations ◽  
Backscatter Electron Detector ◽  
Voltage Scanning

Electromigration and stress voiding have been active areas of research in the microelectronics industry for many years. While accelerated testing of these phenomena has been performed for the last 25 years[1-2], only recently has the introduction of high voltage scanning electron microscopy (HVSEM) made possible in situ testing of realistic, passivated, full thickness samples at high resolution.With a combination of in situ HVSEM and post-testing transmission electron microscopy (TEM) , electromigration void nucleation sites in both normal polycrystalline and near-bamboo pure Al were investigated. The effect of the microstructure of the lines on the void motion was also studied.The HVSEM used was a slightly modified JEOL 1200 EX II scanning TEM with a backscatter electron detector placed above the sample[3]. To observe electromigration in situ the sample was heated and the line had current supplied to it to accelerate the voiding process. After testing lines were prepared for TEM by employing the plan-view wedge technique [6].

HREM image simulations for supported metal particle catalysts

1993 ◽  
Vol 51 ◽  
pp. 736-737 ◽  
Author(s):  
Ming-Hui Yao ◽  
David J. Smith
Keyword(s):  
Fine Particles ◽  
Amorphous Material ◽  
Chemical Properties ◽  
Morphological Features ◽  
Metal Particles ◽  
Plan View ◽  
Profile View ◽  
Imaging Conditions ◽  
Image Simulations ◽  
Supported Metal

The chemical properties of catalysts often depend on the size, shape and structure of the supported metal particles. To characterize these morphological features and relate them to catalysis is one of the main objectives for HREM study of catalysts. However, in plan view imaging, details of the shape and structure of ultra-fine supported particles (<2nm) are often obscured by the overlapping contrast from the support, and supported sub-nanometer particles are sometimes even invisible. Image simulations may help in the interpretation at HREM images of supported particles in particular to extract useful information about the size, shape and structure of the particles. It should also be a useful tool for evaluating the imaging conditions in terms of visibility of supported particles. P. L. Gai et al have studied contrast from metal particles supported on amorphous material using multislice simulations. In order to better understand the influence of a crystalline support on the visibility and apparent morphological features of supported fine particles, we have calculated images of Pt and Re particles supported on TiO2(rutile) in both plan view and profile view.

The reaction of amorphous Ni-Nb films with Si in the presence of a native SiO2 layer

1990 ◽  
Vol 48 (4) ◽  
pp. 664-665
Author(s):  
N. Rozhanski ◽  
A. Barg
Keyword(s):  
High Temperature ◽  
Crystallization Temperature ◽  
Diffusion Barriers ◽  
Sio2 Layer ◽  
Si Substrate ◽  
Cross Sectional ◽  
Plan View ◽  
Temperature Range ◽  
Sputter Deposited

Amorphous Ni-Nb alloys are of potential interest as diffusion barriers for high temperature metallization for VLSI. In the present work amorphous Ni-Nb films were sputter deposited on Si(100) and their interaction with a substrate was studied in the temperature range (200-700)°C. The crystallization of films was observed on the plan-view specimens heated in-situ in Philips-400ST microscope. Cross-sectional objects were prepared to study the structure of interfaces.The crystallization temperature of Ni5 0 Ni5 0 and Ni8 0 Nb2 0 films was found to be equal to 675°C and 525°C correspondingly. The crystallization of Ni5 0 Ni5 0 films is followed by the formation of Ni6Nb7 and Ni3Nb nucleus. Ni8 0Nb2 0 films crystallise with the formation of Ni and Ni3Nb crystals. No interaction of both films with Si substrate was observed on plan-view specimens up to 700°C, that is due to the barrier action of the native SiO2 layer.

A Hitherto Undescribed Naturally Occurring Plasma Antagonist of Activated Factor X Inhibitor (Antithrombin III)

1979 ◽  
Author(s):  
E. T. Yin ◽  
W. J. Salsgiver ◽  
O. Tangen
Keyword(s):  
Equilibrium State ◽  
Human Plasma ◽  
Antithrombin Iii ◽  
Circumstantial Evidence ◽  
Incubation Mixture ◽  
Factor X ◽  
Normal Human Plasma ◽  
Plasma Component ◽  
Naturally Occurring ◽  
Normal Human

Circumstantial evidence suggested that normal human plasma contained a substance regulating the neutralization of F.Xa by F.Xa inhibitor(XaI), (Yin et.al.,Adv.Exper. Med. & Biol., 52 : 239, 1975, Plenum Press, N.Y.).This plasma component has now been isolated and partially purified in our laboratory, and tentatively designated as “Anti-XaI”.In experiments employing purified components, when Anti-XaI was incubated at 37°C with F.Xa, Xal and heparin for two minutes at pH7.5, the amount of F.Xa inhibited was inversely proportional to the Anti-XaI concentration. But, when the F.Xa was replaced by thrombin in the incubation mixture, the neutralization of thrombin clotting activity was undisturbed.Anti-XaI was found to be neither PF3 nor PF4.These and other data strongly suggest that the “Antithrombin III pathway” is more complex than currently believed to be. In circulating blood an equilibrium state must exist between Anti-XaI and XaI.Under certain conditions when the Anti-XaI activity is predominant the rate of F.Xa neutralization bv XaI then becomes slower than the activation of prothrombin to thrombin by F.Xa.

Sign in / Sign up

Export Citation Format

Share Document