Effect of irradiation with intermediate-energy ions on structure and electrophysical properties of silicon dioxide films in a mos system
Keyword(s):
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2019 ◽
Vol 23
(3)
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pp. 283-290
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2005 ◽
Vol 22
(5-6)
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pp. 201-204
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1962 ◽
Vol 109
(3)
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pp. 221
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