Modeling the breakdown spots in silicon dioxide films as point contacts
1999 ◽
Vol 75
(7)
◽
pp. 959-961
◽
J. Suñé
◽
E. Miranda
◽
M. Nafría
◽
X. Aymerich
A. Kalnitsky
◽
S. P. Tay
◽
J. P. Ellul
◽
J. W. Andrews
◽
E. A. Irene
◽
...
1994 ◽
Vol 76
(7)
◽
pp. 4372-4376
◽
Philippe Bergonzo
◽
Ian W. Boyd
2005 ◽
Vol 22
(5-6)
◽
pp. 201-204
◽
Edward Eteshola
◽
Leonard J. Brillson
◽
Stephen Craig Lee
2008 ◽
Vol 47
(11)
◽
pp. 8317-8320
Takaaki Hirokane
◽
Naoto Yoshii
◽
Tatsuya Okazaki
◽
Shinichi Urabe
◽
Kazuo Nishimura
◽
...
1962 ◽
Vol 109
(3)
◽
pp. 221
◽
S. W. Ing
◽
R. E. Morrison
◽
J. E. Sandor
1976 ◽
Vol 15
(5)
◽
pp. 381
1989 ◽
Vol 39
(5)
◽
pp. 517
1994 ◽
Vol 65
(14)
◽
pp. 1820-1822
◽
D. A. Buchanan
◽
D. J. DiMaria
◽
C‐A. Chang
◽
Y. Taur
1989 ◽
Vol 39
(10)
◽
pp. 986
W.S. Lau
◽
K.S. Pey
◽
W.T. Ng
◽
V. Sane
◽
J.M.C. Heng
◽
...