Surface morphology of high-temperature superconductor thin films using scanning tunnelling microscopy

1992 ◽  
Vol 27 (18) ◽  
pp. 4871-4877
Author(s):  
M. A. Harmer ◽  
C. R. Fincher ◽  
B. Parkinson
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Surface Morphology ◽  
High Temperature Superconductor ◽  
Scanning Tunnelling Microscopy ◽  
Scanning Tunnelling ◽  
Tunnelling Microscopy ◽  
Superconductor Thin Films

Scanning tunnelling microscopy on the growth and structure of NiO(100) and CoO(100) thin films

1999 ◽  
Vol 114 ◽  
pp. 129-140 ◽  
Author(s):  
Ina Sebastian ◽  
Thomas Bertrams ◽  
Klaus Meinel ◽  
Henning Neddermeyer
Keyword(s):  
Thin Films ◽  
Scanning Tunnelling Microscopy ◽  
Scanning Tunnelling ◽  
Tunnelling Microscopy

IN SITU GROWTH OF HIGH TEMPERATURE SUPERCONDUCTOR THIN FILMS WITH EVAPORATION TECHNIQUES USING AN OZONE JET

1990 ◽  
pp. 407-413
Author(s):  
H.M. Appelboom ◽  
J.P. Adriaanse ◽  
H.I. de Groot ◽  
G. Rietveld ◽  
D. van der Marel ◽  
...  
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
High Temperature Superconductor ◽  
In Situ Growth ◽  
Superconductor Thin Films

Comparisons of high temperature superconductor thin films on various substrates for microwave applications

1991 ◽  
Vol 206 (1-2) ◽  
pp. 116-121 ◽  
Author(s):  
K.H. Young ◽  
G.V. Negrete ◽  
M.M. Eddy ◽  
J.Z. Sun ◽  
T.W. James ◽  
...  
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
High Temperature Superconductor ◽  
Microwave Applications ◽  
Superconductor Thin Films

Stress Evolution Kinetics in Ultra Thin Sputtered Au Films

1994 ◽  
Vol 356 ◽  
Author(s):  
Quanmin Su ◽  
Cecile Bailly ◽  
Manfred Wuttig ◽  
Sean Corcoran ◽  
Karl Sieradzki
Keyword(s):  
Surface Morphology ◽  
Scanning Tunnelling Microscopy ◽  
Intrinsic Stress ◽  
Characteristic Relaxation Time ◽  
Stress Evolution ◽  
Sharp Maximum ◽  
Membrane Technique ◽  
Scanning Tunnelling ◽  
Tunnelling Microscopy ◽  
Sputter Deposited

AbstractThe stress and microstructure of a thin film evolve in time if the deposition is interrupted or terminated. To establish the parameters which control the kinetics of both processes, ultra thin Au layers were sputter deposited on Si membranes and the stress evolution was monitored by a vibrating membrane technique. The evolution of the surface morphology was studied by scanning tunnelling microscopy. Aging after the termination of each deposition causes stress evolution towards higher tension which, around ambient temperature, follows an exponential law with a characteristic relaxation time of the order of tenths of seconds. This time was found to depend strongly on the accumulated film thickness as well as the surface morphology. The intrinsic stress of the depositing layer increases with the coverage of the film on the substrate. Scanning Tunnelling Microscopy shows that the film grows in a Volmer-Weber mode and that the average stress reaches a sharp maximum as the film become continuous.

In situ growth of high temperature superconductor thin films with evaporation techniques using an ozone jet

1990 ◽  
Vol 164-165 ◽  
pp. 407-413 ◽  
Author(s):  
H.M. Appelboom ◽  
J.P. Adriaanse ◽  
H.I. de Groot ◽  
G. Rietveld ◽  
D. van der Marel ◽  
...  
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
High Temperature Superconductor ◽  
In Situ Growth ◽  
Superconductor Thin Films
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