New dimension in nano-imaging: breaking through the diffraction limit with scanning near-field optical microscopy

2004 ◽  
Vol 381 (1) ◽  
pp. 165-172 ◽  
Author(s):  
Akiko Rasmussen ◽  
Volker Deckert
Author(s):  
R. Giridharagopal ◽  
T.M. Eiles ◽  
B. Niu

Abstract We present the first known images acquired using near-field scanning optical microscopy (NSOM) through backside silicon on functional integrated circuit samples with higher resolution than conventional fault isolation (FI) tools. NSOM offers the possibility of substantially-improved lateral resolution independent of excitation wavelength. Current FI techniques have challenged the resolution limits of conventional optics technology, even in the best solid immersion lens (SIL) to date. This poses a problem for future process technology nodes. This resolution barrier is a by-product of the diffraction limit. In Fourier terms, a conventional lens filters out highfrequency information and thus limits the resolution. In NSOM, by placing a tip with an aperture in extreme proximity to the surface it is possible to capture the near-field light that contains high-frequency information, thereby circumventing the diffraction limit. The tangible benefit is that the resolution is substantially improved. We show that NSOM can be used in backside subsurface imaging of silicon, mirroring the paradigm used in typical optical FI. We present optical reflectance data through ~100 nm of remaining backside Si on functional 22 nm CMOS IC parts with lateral resolution approaching 100 nm. We then discuss potential methods for using NSOM in practical backside fault isolation applications and for improving signal-to-noise ratio (SNR).


2021 ◽  
Author(s):  
Matthias M. Wiecha ◽  
Amin Soltani ◽  
Hartmut G. Roskos

Spectroscopy and imaging with terahertz radiation propagating in free space suffer from the poor spatial resolution which is a consequence of the comparatively large wavelength of the radiation (300 μm at 1 THz in vacuum) in combination with the Abbe diffraction limit of focusing. A way to overcome this limitation is the application of near-field techniques. In this chapter, we focus on one of them, scattering-type Scanning Near-field Optical Microscopy (s-SNOM) which − due to its versatility − has come to prominence in recent years. This technique enables a spatial resolution on the sub-100-nm length scale independent of the wavelength. We provide an overview of the state-of-the-art of this imaging and spectroscopy modality, and describe a few selected application examples in more detail.


2001 ◽  
Vol 114 (23) ◽  
pp. 4153-4160
Author(s):  
Frank de Lange ◽  
Alessandra Cambi ◽  
Richard Huijbens ◽  
Bärbel de Bakker ◽  
Wouter Rensen ◽  
...  

Throughout the years, fluorescence microscopy has proven to be an extremely versatile tool for cell biologists to study live cells. Its high sensitivity and non-invasiveness, together with the ever-growing spectrum of sophisticated fluorescent indicators, ensure that it will continue to have a prominent role in the future. A drawback of light microscopy is the fundamental limit of the attainable spatial resolution – ∼250 nm – dictated by the laws of diffraction. The challenge to break this diffraction limit has led to the development of several novel imaging techniques. One of them, near-field scanning optical microscopy (NSOM), allows fluorescence imaging at a resolution of only a few tens of nanometers and, because of the extremely small near-field excitation volume, reduces background fluorescence from the cytoplasm to the extent that single-molecule detection sensitivity becomes within reach. NSOM allows detection of individual fluorescent proteins as part of multimolecular complexes on the surface of fixed cells, and similar results should be achievable under physiological conditions in the near future.


2008 ◽  
Vol 14 (5) ◽  
pp. 1343-1352 ◽  
Author(s):  
Jasbinder S. Sanghera ◽  
Ishwar D. Aggarwal ◽  
Antonio Cricenti ◽  
Renato Generosi ◽  
Marco Luce ◽  
...  

Author(s):  
Richard J. Hermann ◽  
Michael J. Gordon

Light-matter interactions can provide a wealth of detailed information about the structural, electronic, optical, and chemical properties of materials through various excitation and scattering processes that occur over different length, energy, and timescales. Unfortunately, the wavelike nature of light limits the achievable spatial resolution for interrogation and imaging of materials to roughly λ/2 because of diffraction. Scanning near-field optical microscopy (SNOM) breaks this diffraction limit by coupling light to nanostructures that are specifically designed to manipulate, enhance, and/or extract optical signals from very small regions of space. Progress in the SNOM field over the past 30 years has led to the development of many methods to optically characterize materials at lateral spatial resolutions well below 100 nm. We review these exciting developments and demonstrate how SNOM is truly extending optical imaging and spectroscopy to the nanoscale.


ChemPhysChem ◽  
2011 ◽  
Vol 13 (4) ◽  
pp. 927-929 ◽  
Author(s):  
Miriam Böhmler ◽  
Achim Hartschuh

APL Photonics ◽  
2021 ◽  
Vol 6 (3) ◽  
pp. 036102
Author(s):  
Tobias Nörenberg ◽  
Lukas Wehmeier ◽  
Denny Lang ◽  
Susanne C. Kehr ◽  
Lukas M. Eng

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