Hydrogenated amorphous carbon thin films deposited by plasma-assisted chemical vapor deposition enhanced by electrostatic confinement: structure, properties, and modeling

2014 ◽  
Vol 117 (3) ◽  
pp. 1217-1225 ◽  
Author(s):  
S. M. M. Dufrène ◽  
F. Cemin ◽  
M. R. F. Soares ◽  
C. Aguzzoli ◽  
M. E. H. Maia da Costa ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Hydrogenated Amorphous Carbon ◽  
Electrostatic Confinement ◽  
Carbon Thin Films ◽  
Hydrogenated Amorphous ◽  
Structure Properties

NITROGEN INCORPORATED HYDROGENATED AMORPHOUS CARBON THIN FILMS DEPOSITED BY MICROWAVE SURFACE-WAVE PLASMA CHEMICAL VAPOR DEPOSITION

2009 ◽  
Vol 23 (09) ◽  
pp. 2159-2165 ◽  
Author(s):  
SUDIP ADHIKARI ◽  
MASAYOSHI UMENO
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Surface Wave ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Hydrogenated Amorphous Carbon ◽  
Plasma Chemical Vapor Deposition ◽  
Hydrogenated Amorphous

Nitrogen incorporated hydrogenated amorphous carbon (a-C:N:H) thin films have been deposited by microwave surface-wave plasma chemical vapor deposition on silicon and quartz substrates, using helium, methane and nitrogen ( N 2) as plasma source. The deposited a-C:N:H films were characterized by their optical, structural and electrical properties through UV/VIS/NIR spectroscopy, Raman spectroscopy, atomic force microscope and current-voltage characteristics. The optical band gap decreased gently from 3.0 eV to 2.5 eV with increasing N 2 concentration in the films. The a-C:N:H film shows significantly higher electrical conductivity compared to that of N 2-free a-C:H film.

scholarly journals Hydrogenated amorphous carbon thin films deposition by pulsed DC plasma enhanced by electrostatic confinement

2014 ◽  
Vol 258 ◽  
pp. 219-224 ◽  
Author(s):  
S.M.M. Dufrène ◽  
F. Cemin ◽  
M.R.F. Soares ◽  
C. Aguzzoli ◽  
M.E.H. Maia da Costa ◽  
...  
Keyword(s):  
Thin Films ◽  
Amorphous Carbon ◽  
Dc Plasma ◽  
Hydrogenated Amorphous Carbon ◽  
Pulsed Dc ◽  
Electrostatic Confinement ◽  
Carbon Thin Films ◽  
Hydrogenated Amorphous
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