Monitoring of amorfization of the oxygen implanted layers in silicon wafers using photothermal radiometry and modulated free carrier absorption methods
Keyword(s):
2013 ◽
Vol 34
(8-9)
◽
pp. 1721-1726
◽
Keyword(s):
Keyword(s):
2010 ◽
Vol 214
◽
pp. 012116
◽
2014 ◽
Vol 67
◽
pp. 604-608
◽
2008 ◽
Vol 153
(1)
◽
pp. 275-277
Keyword(s):
2012 ◽
Vol 33
(10-11)
◽
pp. 2076-2081