Efficient ab initio analysis of quantum confinement and band structure effects in ultra-scaled Si1−xGex gate-all-around and fin field-effect transistors for sub-10 nm technology nodes
2018 ◽
Vol 17
(4)
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pp. 1399-1409
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2019 ◽
Vol 45
(7)
◽
pp. 9339-9347
◽
Keyword(s):
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