Correlation between optical emission spectra and the process parameters of a 915 MHz microwave plasma CVD reactor used for depositing polycrystalline diamond coatings

ABSTRACTThe technology to fabricate polycrystalline diamond film resistors has been initiated using modified thick film patterning techniques and in situ solid source doping.Doping of polycrystalline diamond films in microwave plasma CVD systems has been achieved historically through use of diborane gas, which may contaminate the deposition system causing all diamond films thereafter to be doped p-type. We have attempted noncontaminating in situ doping utilizing two solid source dopants, and have met with preliminary success.The more effective source (B2O3) produces a fairly even dopant concentration across the substrate, with sheet resistances ranging from 800 ohms per square to 4500 ohms per square. The other source (BN) showed significant doping in a narrow band surrounding the source, but the doping concentration decreased rapidly with distance from the source. Films grown afterwards with no doping were evaluated through resistance measurements; no evidence of doping contamination was observed.

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Comparative measurements of acceptor concentration at the growth and nucleation side of microwave plasma CVD polycrystalline diamond films

Diamond and Related Materials ◽

10.1016/s0925-9635(02)00299-6 ◽

2003 ◽

Vol 12 (3-7) ◽

pp. 531-537 ◽

Cited By ~ 4

Author(s):

V.G. Ralchenko ◽

Y.V. Pleskov ◽

V.I. Polyakov ◽

A.V. Khomich ◽

Y.E. Evstefeeva ◽

...

Keyword(s):

Microwave Plasma ◽

Diamond Films ◽

Polycrystalline Diamond ◽

Plasma Cvd ◽

Acceptor Concentration ◽

Microwave Plasma Cvd

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An effort in planarising microwave plasma CVD grown polycrystalline diamond (PCD) coated 4in. Si wafers

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2015.11.016 ◽

2016 ◽

Vol 43 ◽

pp. 1-7 ◽

Cited By ~ 3

Author(s):

Awadesh Kumar Mallik ◽

Radhaballabh Bhar ◽

Sandip Bysakh

Keyword(s):

Microwave Plasma ◽

Polycrystalline Diamond ◽

Plasma Cvd ◽

Microwave Plasma Cvd

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Characterizations of microwave plasma CVD grown polycrystalline diamond coatings for advanced technological applications

Processing and Application of Ceramics ◽

10.2298/pac1402069m ◽

2014 ◽

Vol 8 (2) ◽

pp. 69-80 ◽

Cited By ~ 4

Author(s):

Awadesh Mallik ◽

Nandadulal Dandapat ◽

Shirshendu Chakraborty ◽

Ashok Mandal ◽

Jiten Ghosh ◽

...

Keyword(s):

Photoelectron Spectroscopy ◽

Microwave Plasma ◽

Plasma Reactor ◽

Polycrystalline Diamond ◽

Potential Candidate ◽

Diamond Coatings ◽

Etching Technique ◽

X Ray ◽

Microwave Plasma Cvd ◽

Scanning Electronmicroscopy

Polycrystalline diamond (PCD) coatings ranging from few microns to several hundred microns thickness have been grown by 915MHz microwave plasma reactor with 9000W power. The coatings were deposited on 100mm diameter silicon (Si) substrate from few hours to several days of continuous runs. PCD coatings were made freestanding by wet chemical etching technique. The deposited PCDs were evaluated by X-ray diffraction (XRD), scanning electronmicroscopy (SEM), Raman spectroscopy,X-ray photoelectron spectroscopy (XPS) for physical characterization and compared with authors? earlier work. Refractive index of 2.41 was obtained at 633 nm wavelength and a maximum of 6.6 W?cm-1K-1 value for thermal conductivity could be achieved with the grown coatings. The values are well above the existing non-diamond heat spreading substrates, which makes the grown PCDs as candidates for heat spreaders in different technological applications. High refractive in- dex along with translucent nature of the white freestanding PCDs, make them potential candidate for optical windows.

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