Large Area Deposition of Polycrystalline Diamond Coatings by Microwave Plasma CVD

2013 ◽  
Vol 72 (4) ◽  
pp. 225-232 ◽  
Author(s):  
Awadesh K. Mallik ◽  
Sandip Bysakh ◽  
Kalyan S. Pal ◽  
Nandadulal Dandapat ◽  
Bichitra K. Guha ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Polycrystalline Diamond ◽  
Diamond Coatings ◽  
Plasma Cvd ◽  
Large Area ◽  
Microwave Plasma Cvd ◽  
Area Deposition

Large area deposition of 〈100〉-textured diamond films by a 60-kW microwave plasma CVD reactor

2002 ◽  
Vol 11 (3-6) ◽  
pp. 596-600 ◽  
Author(s):  
Yutaka Ando ◽  
Yoshihiro Yokota ◽  
Takeshi Tachibana ◽  
Akihiko Watanabe ◽  
Yoshiki Nishibayashi ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Diamond Films ◽  
Plasma Cvd ◽  
Large Area ◽  
Microwave Plasma Cvd ◽  
Area Deposition

scholarly journals Large area microwave plasma CVD of diamond using composite right/left-handed materials

2021 ◽  
Vol 116 ◽  
pp. 108394
Author(s):  
Justas Zalieckas ◽  
Paulius Pobedinskas ◽  
Martin Møller Greve ◽  
Kristoffer Eikehaug ◽  
Ken Haenen ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Plasma Cvd ◽  
Large Area ◽  
Left Handed ◽  
Microwave Plasma Cvd

Deposition of large area uniform diamond films by microwave plasma CVD

Vacuum ◽  
2018 ◽  
Vol 147 ◽  
pp. 134-142 ◽  
Author(s):  
J. Weng ◽  
F. Liu ◽  
L.W. Xiong ◽  
J.H. Wang ◽  
Q. Sun
Keyword(s):  
Microwave Plasma ◽  
Diamond Films ◽  
Plasma Cvd ◽  
Large Area ◽  
Microwave Plasma Cvd

Plateholder design for deposition of uniform diamond coatings on WC-Co substrates by microwave plasma CVD for efficient turning application

2017 ◽  
Vol 75 ◽  
pp. 169-175 ◽  
Author(s):  
E.E. Ashkihazi ◽  
V.S. Sedov ◽  
D.N. Sovyk ◽  
A.A. Khomich ◽  
A.P. Bolshakov ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Diamond Coatings ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

Deposition of large-area, high-quality cubic boron nitride films by ECR-enhanced microwave-plasma CVD

2003 ◽  
Vol 76 (6) ◽  
pp. 953-955 ◽  
Author(s):  
W.J. Zhang ◽  
C.Y. Chan ◽  
K.M. Chan ◽  
I. Bello ◽  
Y. Lifshitz ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Microwave Plasma ◽  
Cubic Boron Nitride ◽  
Plasma Cvd ◽  
Large Area ◽  
High Quality ◽  
Microwave Plasma Cvd ◽  
Boron Nitride Films

Large area diamond nucleation on Si(001) using magnetoactive microwave plasma CVD

1997 ◽  
Vol 113-114 ◽  
pp. 244-248 ◽  
Author(s):  
Hyeongmin Jeon ◽  
Akimitsu Hatta ◽  
Hidetoshi Suzuki ◽  
Toshimichi Ito ◽  
Takatomo Sasaki ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Plasma Cvd ◽  
Large Area ◽  
Diamond Nucleation ◽  
Microwave Plasma Cvd

Microwave-plasma-CVD of diamond coatings onto titanium and titanium alloys

1998 ◽  
Vol 98 (1-3) ◽  
pp. 1079-1091 ◽  
Author(s):  
T. Grögler ◽  
E. Zeiler ◽  
A. Hörner ◽  
S.M. Rosiwal ◽  
R.F. Singer
Keyword(s):  
Titanium Alloys ◽  
Microwave Plasma ◽  
Diamond Coatings ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

Polycrystalline Diamond Film Resistors

1992 ◽  
Vol 242 ◽  
Author(s):  
L. M. Edwards ◽  
J. L. Davidson
Keyword(s):  
Diamond Film ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Polycrystalline Diamond ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
P Type ◽  
Polycrystalline Diamond Film ◽  
Effective Source

ABSTRACTThe technology to fabricate polycrystalline diamond film resistors has been initiated using modified thick film patterning techniques and in situ solid source doping.Doping of polycrystalline diamond films in microwave plasma CVD systems has been achieved historically through use of diborane gas, which may contaminate the deposition system causing all diamond films thereafter to be doped p-type. We have attempted noncontaminating in situ doping utilizing two solid source dopants, and have met with preliminary success.The more effective source (B2O3) produces a fairly even dopant concentration across the substrate, with sheet resistances ranging from 800 ohms per square to 4500 ohms per square. The other source (BN) showed significant doping in a narrow band surrounding the source, but the doping concentration decreased rapidly with distance from the source. Films grown afterwards with no doping were evaluated through resistance measurements; no evidence of doping contamination was observed.

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