scholarly journals Characterizations of microwave plasma CVD grown polycrystalline diamond coatings for advanced technological applications

2014 ◽  
Vol 8 (2) ◽  
pp. 69-80 ◽  
Author(s):  
Awadesh Mallik ◽  
Nandadulal Dandapat ◽  
Shirshendu Chakraborty ◽  
Ashok Mandal ◽  
Jiten Ghosh ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Microwave Plasma ◽  
Plasma Reactor ◽  
Polycrystalline Diamond ◽  
Potential Candidate ◽  
Diamond Coatings ◽  
Etching Technique ◽  
X Ray ◽  
Microwave Plasma Cvd ◽  
Scanning Electronmicroscopy

Polycrystalline diamond (PCD) coatings ranging from few microns to several hundred microns thickness have been grown by 915MHz microwave plasma reactor with 9000W power. The coatings were deposited on 100mm diameter silicon (Si) substrate from few hours to several days of continuous runs. PCD coatings were made freestanding by wet chemical etching technique. The deposited PCDs were evaluated by X-ray diffraction (XRD), scanning electronmicroscopy (SEM), Raman spectroscopy,X-ray photoelectron spectroscopy (XPS) for physical characterization and compared with authors? earlier work. Refractive index of 2.41 was obtained at 633 nm wavelength and a maximum of 6.6 W?cm-1K-1 value for thermal conductivity could be achieved with the grown coatings. The values are well above the existing non-diamond heat spreading substrates, which makes the grown PCDs as candidates for heat spreaders in different technological applications. High refractive in- dex along with translucent nature of the white freestanding PCDs, make them potential candidate for optical windows.

Realization Of X-Ray Lithography Masks Based On Diamond Membranes

1993 ◽  
Vol 306 ◽  
Author(s):  
M. F. Ravet ◽  
A. Gicquel ◽  
E. Anger ◽  
Z. Z. Wang ◽  
Y. Chen ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Plasma Reactor ◽  
Diamond Films ◽  
Polycrystalline Diamond ◽  
Nucleation And Growth ◽  
Local Conditions ◽  
X Ray ◽  
Deposition Parameters ◽  
Deposition Conditions

AbstractDeposition parameters acting on nucleation and growth local conditions have been optimized in a bell jar microwave plasma reactor to obtain polycrystalline diamond thin films compatible with X-ray membrane requests. The microstructure and the chemical quality of the films were estimated by SEM and Raman spectroscopy respectively, the roughness was evaluated by AFM experiments and the residual stress was deduced from the substrate deflection method. Membranes were obtained by removing the silicon substrate on 15 mm diameter circular windows. The optical transparency depending on deposition conditions was optimized up to 65% at 630 nm for 1 μm thickness. A high resolution additive mask process, based on well taut membranes and low stress electroplated gold absorber, was carried out. Micrometric and submicrometric mask patterns were generated in photoresists both by electron beam lithography with a nanopattern generator and by X-ray lithography using the synchrotron radiation facility implemented at LURE-Orsay. Despite the diamond films roughness of the order of 30 nm, well defined dots and lines as narrow as 100–200 nm could be obtained.

Large Area Deposition of Polycrystalline Diamond Coatings by Microwave Plasma CVD

2013 ◽  
Vol 72 (4) ◽  
pp. 225-232 ◽  
Author(s):  
Awadesh K. Mallik ◽  
Sandip Bysakh ◽  
Kalyan S. Pal ◽  
Nandadulal Dandapat ◽  
Bichitra K. Guha ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Polycrystalline Diamond ◽  
Diamond Coatings ◽  
Plasma Cvd ◽  
Large Area ◽  
Microwave Plasma Cvd ◽  
Area Deposition

X-Ray Photoelectron-Spectroscopic Studies of Carbon Fiber Surfaces. Part IX: The Effect of Microwave Plasma Treatment on Carbon Fiber Surfaces

1989 ◽  
Vol 43 (7) ◽  
pp. 1153-1158 ◽  
Author(s):  
Yaoming Xie ◽  
Peter M. A. Sherwood
Keyword(s):  
Carbon Fiber ◽  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Prolonged Exposure ◽  
Microwave Plasma ◽  
Spectroscopic Studies ◽  
X Ray ◽  
Fiber Damage ◽  
Surface Functionality ◽  
Fiber Treatment

X-ray photoelectron spectroscopy has been used to monitor the surface chemical changes occurring on type II carbon fibers exposed to air, oxygen, and nitrogen plasmas. In all cases the plasmas caused changes in surface functionality, in terms of both C-O and C-N functionality. Prolonged exposure to the plasmas caused loss of surface functionality for air and oxygen plasmas, and extended treatment caused fiber damage. Plasma treatment of fibers promises to be an effective method of fiber treatment.

Nitriding of yttria-stabilized zirconia in atmospheric pressure microwave plasma

2009 ◽  
Vol 24 (6) ◽  
pp. 2021-2028 ◽  
Author(s):  
R. Milani ◽  
R.P. Cardoso ◽  
T. Belmonte ◽  
C.A. Figueroa ◽  
C.A. Perottoni ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Atmospheric Pressure ◽  
Microwave Plasma ◽  
Plasma Nitriding ◽  
Nitrided Layer ◽  
Zirconium Nitride ◽  
Stabilized Zirconia ◽  
Partially Stabilized Zirconia ◽  
X Ray ◽  
Yttria Partially Stabilized Zirconia

High temperature plasma nitriding of yttria-partially-stabilized zirconia in atmospheric pressure microwave plasma was investigated. The morphological, mechanical, and physicochemical characteristics of the resulting nitrided layer were characterized by different methods, such as optical and scanning electron microscopy, microindentation, x-ray diffraction, narrow resonant nuclear reaction profiling, secondary neutral mass spectrometry, and x-ray photoelectron spectroscopy, aiming at investigating the applicability of this highly efficient process for nitriding of ceramics. The structure of the plasma nitrided layer was found to be complex, composed of tetragonal and cubic zirconia, as well as zirconium nitride and oxynitride. The growth rate of the nitrided layer, 4 µm/min, is much higher than that obtained by any other previous nitriding process, whereas a typical 50% increase in Vickers hardness over that of yttria-partially-stabilized zirconia was observed.

Plateholder design for deposition of uniform diamond coatings on WC-Co substrates by microwave plasma CVD for efficient turning application

2017 ◽  
Vol 75 ◽  
pp. 169-175 ◽  
Author(s):  
E.E. Ashkihazi ◽  
V.S. Sedov ◽  
D.N. Sovyk ◽  
A.A. Khomich ◽  
A.P. Bolshakov ◽  
...  
Keyword(s):  
Microwave Plasma ◽  
Diamond Coatings ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

X-ray Photoelectron Spectroscopy of the Interface Between Diamond Films and Tantalum Substrates

1993 ◽  
Vol 317 ◽  
Author(s):  
M.M. Waitew ◽  
S. Ismat Shah
Keyword(s):  
Photoelectron Spectroscopy ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Diamond Growth ◽  
Plasma Chemical ◽  
X Ray ◽  
Plasma Chemical Vapor Deposition ◽  
Stages Of Growth ◽  
Diamond Peak

ABSTRACTDiamond films were deposited in a microwave plasma chemical vapor deposition (MPCVD) system on Ta substrates using a mixture of hydrogen and methane gases. The films were grown for varying lengths of time to provide samples with no diamond growth to a continuous diamond film. These films were analyzed using X-ray photoelectron spectroscopy (XPS) in order to understand the time dependent interactions between the substrate and the incoming carbon flux. Photoelectron peaks in the Ta 4f, C Is and Ols regions have been analyzed. In the initial stages of growth, a layer of carbide forms on the substrate. As the substrate becomes supersaturated with carbon, graphite starts to form on the surface. A diamond peak begins to appear after about 30 Minutes of deposition.

Synthesis of Crystalline Carbon Nitride by Microwave Plasma Chemical Vapor Deposition

2005 ◽  
Vol 480-481 ◽  
pp. 71-76 ◽  
Author(s):  
Jin Chun Jiang ◽  
Wen Juan Cheng ◽  
Yang Zhang ◽  
He Sun Zhu ◽  
De Zhong Shen
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Photoelectron Spectroscopy ◽  
Carbon Nitride ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Method ◽  
Plasma Chemical ◽  
X Ray ◽  
Plasma Chemical Vapor Deposition

Carbon nitride films were grown on Si substrates by a microwave plasma chemical vapor deposition method, using mixture of N2, CH4 and H2 as precursor. Scanning electron microscopy shows that the films consisted of a large number of hexagonal crystallites. The dimension of the largest crystallite is about 3 µm. The X-ray photoelectron spectroscopy suggests that nitrogen and carbon in the films are bonded through hybridized sp2 and sp3 configurations. The X-ray diffraction pattern indicates that the major part of the films is composed of α-, β-, pseudocubic C3N4 and graphitic C3N4. The Raman peaks match well with the calculated Raman frequencies of α- and β-C3N4, revealing the formation of the α- and β-C3N4 phase.

Microwave-plasma-CVD of diamond coatings onto titanium and titanium alloys

1998 ◽  
Vol 98 (1-3) ◽  
pp. 1079-1091 ◽  
Author(s):  
T. Grögler ◽  
E. Zeiler ◽  
A. Hörner ◽  
S.M. Rosiwal ◽  
R.F. Singer
Keyword(s):  
Titanium Alloys ◽  
Microwave Plasma ◽  
Diamond Coatings ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd
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