Radio frequency bias power effects on silicon nitride film deposited in SiH4-NH3 using a plasma-enhanced chemical vapor deposition
2009 ◽
Vol 15
(5)
◽
pp. 881-885
◽
Keyword(s):
1993 ◽
Vol 32
(Part 1, No. 1B)
◽
pp. 462-468
◽
1995 ◽
Vol 34
(Part 1, No. 9A)
◽
pp. 4736-4740
◽
1992 ◽
2015 ◽
Vol 54
(8S1)
◽
pp. 08KD12
◽
Keyword(s):
Keyword(s):
1996 ◽
Vol 35
(Part 1, No. 2B)
◽
pp. 1509-1512
◽
Keyword(s):
2011 ◽
Vol 38
(9)
◽
pp. 11437-11441
◽
2009 ◽
Vol 60
(8)
◽
pp. 703-705
◽